Cobalt silicide may refer to the following chemical compounds:
Silicon is a chemical element with the symbol Si and atomic number 14. It is a hard, brittle crystalline solid with a blue-grey metallic lustre, and is a tetravalent metalloid and semiconductor. It is a member of group 14 in the periodic table: carbon is above it; and germanium, tin, and lead are below it. It is relatively unreactive. Because of its high chemical affinity for oxygen, it was not until 1823 that Jöns Jakob Berzelius was first able to prepare it and characterize it in pure form. Its oxides form a family of anions known as silicates. Its melting and boiling points of 1414 °C and 3265 °C respectively are the second-highest among all the metalloids and nonmetals, being only surpassed by boron. Silicon is the eighth most common element in the universe by mass, but very rarely occurs as the pure element in the Earth's crust. It is most widely distributed in space in cosmic dusts, planetoids, and planets as various forms of silicon dioxide (silica) or silicates. More than 90% of the Earth's crust is composed of silicate minerals, making silicon the second most abundant element in the Earth's crust, after oxygen. Silicon is a natural element, and when not previously present has a residence time of about 400 years in the world's oceans.
Silane is an inorganic compound with chemical formula, SiH4, making it a group 14 hydride. It is a colourless, pyrophoric, toxic gas with a sharp, repulsive smell, somewhat similar to that of acetic acid. Silane is of practical interest as a precursor to elemental silicon.
Cobalt(II) chloride is an inorganic compound of cobalt and chlorine, with the formula CoCl
2. It is a sky blue crystalline solid.
A silicide is a compound that has silicon with (usually) more electropositive elements.
Cobalt oxide is a family of chemical compounds consisting of Cobalt and Oxygen atoms.
The A15 phases (also known as β-W or Cr3Si structure types) are series of intermetallic compounds with the chemical formula A3B (where A is a transition metal and B can be any element) and a specific structure. Many of these compounds have superconductivity at around 20 K (−253 °C; −424 °F), which is comparatively high, and remain superconductive in magnetic fields of tens of teslas (hundreds of kilogauss). This kind of superconductivity (Type-II superconductivity) is an important area of study as it has several practical applications.
Disilane is a chemical compound with chemical formula Si2H6 that was identified in 1902 by Henri Moissan and Samuel Smiles (1877–1953). Moissan and Smiles reported disilane as being among the products formed by the action of dilute acids on metal silicides. Although these reactions had been previously investigated by Friedrich Woehler and Heinrich Buff between 1857 and 1858, Moissan and Smiles were the first to explicitly identify disilane. They referred to disilane as silicoethane. Higher members of the homologous series SinH2n+2 formed in these reactions were subsequently identified by Carl Somiesky (sometimes spelled "Karl Somieski") and Alfred Stock.
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material.
The term salicide refers to a technology used in the microelectronics industry used to form electrical contacts between the semiconductor device and the supporting interconnect structure. The salicide process involves the reaction of a metal thin film with silicon in the active regions of the device, ultimately forming a metal silicide contact through a series of annealing and/or etch processes. The term "salicide" is a compaction of the phrase self-aligned silicide. The description "self-aligned" suggests that the contact formation does not require photolithography patterning processes, as opposed to a non-aligned technology such as polycide.
Copper silicide (Cu5Si), also called pentacopper silicide, is a binary compound of silicon with copper. It is an intermetallic compound, meaning that it has properties intermediate between an ionic compound and an alloy. This solid crystalline material is a silvery solid that is insoluble in water. It forms upon heating mixtures of copper and silicon.
Silicon tetraazide is a thermally unstable binary compound of silicon and nitrogen with a nitrogen content of 85.7%. This high-energy compound combusts spontaneously and can only be studied in a solution. A further coordination to a six-fold coordinated structure such as a hexaazido silicide [Si(N3)6]2− or as an adduct with bicationic ligands Si(N3)4L2 will result in relatively stable, crystalline solids that can be handled at room temperature.
Binary compounds of silicon are binary chemical compounds containing silicon and one other chemical element. Technically the term silicide is reserved for any compounds containing silicon bonded to a more electropositive element. Binary silicon compounds can be grouped into several classes. Saltlike silicides are formed with the electropositive s-block metals. Covalent silicides and silicon compounds occur with hydrogen and the elements in groups 10 to 17.
Chromium(II) silicide (chromium disilicide) is an inorganic compound. Its chemical formula is CrSi2. It is a p-type thermoelectric semiconductor.
Hexachlorodisilane is the inorganic compound with the chemical formula Si2Cl6. It is a colourless liquid that fumes in moist air. It has specialty applications in as a reagent and as a volatile precursor to silicon metal.
Nickel silicides include several intermetallic compounds of nickel and silicon. Nickel silicides are important in microelectronics as they form at junctions of nickel and silicon. Additionally thin layers of nickel silicides may have application in imparting surface resistance to nickel alloys.
Iron silicide may refer to the following chemical compounds:
Dicobalt silicide (Co2Si) is an intermetallic compound, a silicide of cobalt.
Cobalt disilicide (CoSi2) is an intermetallic compound, a silicide of cobalt. It is a superconductor with a transition temperature of ca. 1.4 K and a critical field of 105 Oe.
Cobalt monosilicide (CoSi) is an intermetallic compound, a silicide of cobalt. It is a diamagnetic semimetal.
Manganese silicide may refer to the following chemical compounds: