Paul Rappaport Award

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The Paul Rappaport Award was established in 1984 to commemorate the achievement of the late American physicist Paul Rappaport. The best paper appearing in a fast turn around archival publication of the IEEE Electron Devices Society is given the award annually. The recipients are awarded a certificate and $2,500, presented at the IEEE EDS International Electron Devices Meeting. [1]

Contents

Recipients

The past recipients are:

YearRecipient(s)Paper
1982 R. Fabian Pease

David B. Tuckerman

High-Performance Heat Sinking for VLS
1983 Jaroslav Hynecek Electron-Hole Recombination Antiblooming for Virtual-Phase CCD Imager
1984Shojiro Asai

Norikazu Hashimoto Kiyoo Itoh Tokuo Kure Hideo Sunami Toru Toyabe

A Corrugated Capacitor Cell (CCC)
1985Roger Epworth

Linus A. Fetter Richard E. Howard Lawrence D. Jackel Paul M. Mankiewich Kristan S. Ralls William J. Skocpol Donald M. Tennant

Single electron switching events in nanometer-scale Si MOSFET's
1986Ben T. Ebihara

Peter Ramins

Improvements in MDC and TWT overall efficiency through the application of carbon electrode surfaces
1987Richard B. True Emittance and the design of beam formation, transport, and collection systems in periodically focused TWT's
1988Diane R. Ahrendt

Yeou-Chong Vladimir F. Drobny Valdis E. Garuts Robert D. Herman Eric E. Lane June S. Lee Evan E. Patton Tadanori Yamaguchi Simon Yu Todd H. Yuzuriha

Process and device performance of a high-speed double poly-Si bipolar technology using borosenic-poly process with coupling-base implant
1989James F. Gibbons

Judy L. Hoyt Clifford A. King

Bandgap and transport properties of Si/sub 1-x/Ge/sub x/ by analysis of nearly ideal Si/Si/sub 1-x/Ge/sub x//Si heterojunction bipolar transistors
1990Khalil Najafi

Kenichiro Suzuki Kensall D. Wise

A 1024-element high-performance silicon tactile imager
1991Hiroshi Fukuda

Akira Imai Shinji Okazaki Tsuneo Terasawa

New approach to resolution limit and advanced image formation techniques in optical lithography
1992April S. Brown

Linda M. Jelloian Loi D. Nguyen Mark A. Thompson

50-nm self-aligned-gate pseudomorphic AlInAs/GaInAs high electron mobility transistors
1993Hisashi Hara

Hiroshi Iwai Toyota Morimoto Masakatsu Tsuchiaki

A new charge pumping method for determining the spatial distribution of hot-carrier-induced fixed charge in p-MOSFETs
1994Takashi Hashimoto

Tomoyuki Ishii Takashi Kobayashi Fumio Murai Koichi Seki Kazuo Yano

Room-temperature single-electron memory
1995Herbert Lifka

Ger M. Paulzen Henk G. Pomp Pierre H. Woerlee Reinout Woltjer

Three Hot-Carrier Degradation Mechanisms in Deep-Submicron PMOSFETS
1996Chris J. Diorio

Paul E. Hasler Carver A. Mead Bradley A. Minch

A Single-Transistor Silicon Synapse
1997Dimitri A. Antoniadis

Anantha P. Chandrakasan Carlin J. Vieri Isabel Y. Yang

Back-Gated CMOS on SOIAS For Dynamic Threshold Voltage Control
1998Yujun Li

Tso-Ping Mai

A Front-Gate Charge-Pumping Method for Probing Both Interfaces in SOI Devices
1999Pallab Bhattacharya

Kishore K. Kamath Jasprit Singh David Klotzkin Jamie Phillips Hong-Tao Jiang Nalini Chervela Theodore B. Norris Tom Sosnowski Joy Laskar M. Ramana Murty

In (Ga)As/GaAs Self-Organized Quantum Dot Lasers: DC and Small-Signal Modulation Properties
2000Didier Dutartre

Malgorzata Jurczak Damien Lenoble Jose Martins Stephanie Monfray Roland Pantel M. Paoli Jorge Luis Regolini Pascal Ribot Thomas Skotnicki Beatrice Tormen

Silicon-on-Nothing (SON)--an Innovative Process for Advanced CMOS
2001Ioannis Kymissis

Christos D. Dimitrakopoulos Sampath Purusothaman

High Performance Bottom Electrode Organic Thin-Film Transistors
Raymond M. Warner, Jr. Microelectronics: Its Unusual Origin and Personality
2002Yee Chia Yeo

Vivek Subramanian Jakub Kedzierski Peiqi Xuan Tsu-Jae King Jeffrey Bokor Chenming Hu

Design & Fabrication of 50-nm Thin-Body p-MOSFETS with a Silicon-Germanium Heterostructure Channel
2003Ken Uchida

Junji Koga Ryuji Ohba Akira Toriumi

Programmable Single-Electron Transistor Logic for future Low-Power Intelligent LSI : Proposal and Room-Temperature Operation
2004Franco Stellari

Peilin Song James C. Tsang Moyra K. McManus Mark B. Ketchen

Testing and Diagnostics of CMOS Circuits Using Light Emission from Off-State Leakage Current
2005Kailash Gopalakrishnan

Peter B. Griffin James D. Plummer Raymond Wood Christoph Jungemann

Impact Ionization MOS (I-MOS) - Part I: Device and Circuit Simulations and Part II: Experimental Results
2006Billy Lau

Alfred Forchel Lukas Worschech David Hartmann

Cascaded Quantum Wires and Integrated Design for Complex Logic Functions: Nanoelectronic Full Adder
2007Azad Naeemi

James D. Meindl

Design and Performance Modeling for Single-Walled Carbon Nanotubes as Local, Semiglobal, and Global Interconnects in Gigascale Integrated Systems
2008Kah-Wee Ang

Jian Qiang Lin Ganesh S. Samudra Shih-Hang Tung Narayanan Balasumbramanian Yee-Chia Yeo

Strained n-MOSFET With Embedded Source/Drain Stressors and Strain-Transfer Structure (STS) for Enhanced Transistor Performance
2009Takao Someya

Tsuyoshi Sekitani Koichiro Zaitsu Yoshiaki Noguchi Kiyoshiro Ishibe Makoto Takamiya Takayasu Sakurai

Printed Nonvolatile Memory for a Sheet-Type Communication System
2010Yusaku Kato

Tsuyoshi Sekitani Yoshiaki Noguchi Tomoyuki Yokota Makoto Takamiya Takayasu Sakurai Takao Someya

Large-Area Flexible Ultrasonic Imaging System With an Organic-Transistor Active Matrix
2011Tibor Grasser

Ben Kaczer Wolfgang Goes Hans Reisinger Thomas Aichinger Philipp Hehenberger Paul-Jürgen Wagner Franz Schanovsky Jacopo Franco María Toledano Luque Michael Nelhiebel

The Paradigm Shift in Understanding the Bias Temperature Instability: From Reaction-Diffusion to Switching Oxide Traps
2012Kelin Kuhn Considerations for Ultimate CMOS Scaling
2013Rui Zhang

Po-Chin Huang Ju-Chin Lin Noriyuki Taoka Mitsuru Takenaka Shinichi Takagias

High-Mobility Ge p- and n-MOSFETs With 0.7-nm EOT Using HfO2/Al2O3/GeOx/Ge Gate Stacks Fabricated by Plasma Postoxidation
2014Sylvain Barraud

Jean-Michel Hartmann Virginie Maffini-Alvaro Lucie Tosti Vincent Delaye Dominique Lafond

Top-Down Fabrication of Epitaxial SiGe/Si Multi-(Core/Shell) p-FET Nanowire Transistors
2015Stefano Ambrogio

Simone Balatti Vincent McCaffrey Daniel C. Wang Daniele Ielmini

Noise-Induced Resistance Broadening in Resistive Switching Memory  Part I: Intrinsic Cell Behavior / Part II: Array Statistics
2016Takatoshi Tsujimura

Takeshi Hakii Suguru Noda

A Color-Tunable Polychromatic Organic-Light-Emitting-Diode Device With Low Resistive Intermediate Electrode for Rollto-Roll Manufacturing
2017L. Witters, H. Arimura, F. Sebaai, A. Hikavyy, A. P. Milenin, R. Loo, A. De Keersgieter, G. Eneman, T. Schram, K. Wostyn, K. Devriendt, A. Schulze, R. Lieten, S. Bilodeau, E. Cooper, P. Storck, E. Chiu, C. Vrancken, P. Favia, E. Vancoille, J. Mitard, R. Langer, A. Opdebeeck, F. Holsteyns, N. Waldron, K. Barla, V. De Heyn, D. Mocuta, and N. Collaert Strained Germanium Gate-All-Around pMOS Device Demonstration Using Selective Wire Release Etch Prior to Replacement Metal Gate Deposition
2018Konstantin Osipov, Joachim Wuerfl, Ina Ostermay, Frank Brunner, Günther Tränkle and Maniteja Bodduluri Local 2DEG Density Control in Heterostructures of Piezoelectric Materials and Its Application in GaN HEMT Fabrication Technology
2019Kihyun Choi, Hyun Chul Sagong, Wonchang Kang, Hyunjin Kim, Jiang Hai, Miji Lee, Bomi Kim, Mi-ji Lee, Soonyoung Lee, Hyewon Shim, Junekyun Park, YoungWoo Cho, Hwa Sung Rhee and Sangwoo Pae Enhanced Reliability of 7nm Process Technology Featuring EUV
2020Kangguo Cheng, Chanro Park, Heng Wu, Juntao Li, Son Nguyen, Jingyun Zhang, Miaomiao Wang, Sanjay Mehta, Zuoguang Liu, Richard Conti, Nicholas J. Loubet, Julien Frougier, Andrew Greene, Tenko Yamashita, Balasubramanian Haran and Rama Divakaruni Improved Air Spacer for Highly Scaled CMOS Technology
2021Jixuan Wu, Fei Mo, Takuya Saraya, Toshiro Hiramoto, Mototaka Ochi, Hiroshi Goto and Masaharu Kobayashi Monolithic Integration of Oxide Semiconductor FET and Ferroelectric Capacitor Enabled by Sn-Doped InGaZnO for 3-D Embedded RAM Application
2022Akshay M. Arabhavi, Filippo Ciabattini, Sara Hamzeloui, Ralf Flückiger, Tamara Saranovac, Daxin Han, Diego Marti, Giorgio Bonomo, Rimjhim Chaudhary, Olivier Ostinelli, and Colombo R. Bolognesi InP/GaAsSb Double Heterojunction Bipolar Transistor Emitter-Fin Technology With fMAX = 1.2 THz
2023Weiyi Li, Brian Romanczyk, Matthew Guidry, Emre Akso, Nirupam Hatui, Christian Wurm, Wenjian Liu, Pawana Shrestha, Henry Collins, Christopher Clymore, Stacia Keller, and Umesh K. Mishra Record RF Power Performance at 94 GHz From Millimeter-Wave N-Polar GaN-on-Sapphire Deep-Recess HEMTs

See also

Paul Rappaport

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References

  1. "Paul Rappaport Award - IEEE Electron Devices Society". eds.ieee.org. Retrieved 2024-12-06.