Gate capacitance

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In electronics, gate capacitance is the capacitance of the gate terminal of a field-effect transistor (FET). It can be expressed as the absolute capacitance of the gate of a transistor, or as the capacitance per unit area of an integrated circuit technology, or as the capacitance per unit width of minimum-length transistors in a technology.

In generations of approximately Dennard scaling of metal-oxide-semiconductor FETs (MOSFETs), the capacitance per unit area has increased inversely with device dimensions. Since the gate area has gone down by the square of device dimensions, the gate capacitance of a transistor has gone down in direct proportion with device dimensions. With Dennard scaling, the capacitance per unit of gate width has remained approximately constant; this measurement can include gate–source and gate–drain overlap capacitances. Other scalings are not uncommon; the voltages and gate oxide thicknesses have not always decreased as rapidly as device dimensions, so the gate capacitance per unit area has not increased as fast, and the capacitance per transistor width has sometimes decreased over generations. [1]

The intrinsic gate capacitance (that is, ignoring fringing fields and other details) for a silicon-dioxide-insulated gate can be calculated from thin-oxide capacitance per unit area as:

where: [2]

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<span class="mw-page-title-main">Permittivity</span> Measure of the electric polarizability of a dielectric material

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<span class="mw-page-title-main">Capacitance</span> Ability of a body to store an electrical charge

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<span class="mw-page-title-main">Threshold voltage</span> Minimum source-to-gate voltage for a field effect transistor to be conducting from source to drain

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<span class="mw-page-title-main">FET amplifier</span>

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In semiconductor electronics, Dennard scaling, also known as MOSFET scaling, is a scaling law which states roughly that, as transistors get smaller, their power density stays constant, so that the power use stays in proportion with area; both voltage and current scale (downward) with length. The law, originally formulated for MOSFETs, is based on a 1974 paper co-authored by Robert H. Dennard, after whom it is named.

<span class="mw-page-title-main">Loop-gap resonator</span>

A loop-gap resonator (LGR) is an electromagnetic resonator that operates in the radio and microwave frequency ranges. The simplest LGRs are made from a conducting tube with a narrow slit cut along its length. The LGR dimensions are typically much smaller than the free-space wavelength of the electromagnetic fields at the resonant frequency. Therefore, relatively compact LGRs can be designed to operate at frequencies that are too low to be accessed using, for example, cavity resonators. These structures can have very sharp resonances making them useful for electron spin resonance (ESR) experiments, and precision measurements of electromagnetic material properties.

A ferroelectric field-effect transistor is a type of field-effect transistor that includes a ferroelectric material sandwiched between the gate electrode and source-drain conduction region of the device. Permanent electrical field polarisation in the ferroelectric causes this type of device to retain the transistor's state in the absence of any electrical bias.

References

  1. A. P. Godse; U. A. Bakshi (2009). Solid State Devices And Circuits. Technical Publications. pp. 4–8. ISBN   9788184316681.[ permanent dead link ]
  2. Plusquellic, Jim. "VLSI slides" . Retrieved 2 May 2021.