Keith Jackson (physicist)

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Keith H. Jackson was an American physicist, a professor of physics, and former president of the National Society of Black Physicists.

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Keith Jackson
BornSeptember 24, 1953
Columbus, Ohio
Died2013
EducationBS, Morehouse College

BS, Georgia Institute of Technology

Ph.D., Stanford University
Occupation(s)physicist, physics professor

Life and education

Jackson was born in Columbus, Ohio on September 24, 1953. [1] He earned a bachelor's degree in physics from Morehouse College and a bachelor's degree in electrical engineering at the Georgia Institute of Technology. [1]   In 1979, he earned a master's degree from Stanford University in physics, followed by a Ph.D. in physics in 1982. [1] His thesis research was in the area of photo-dissociation, and his advisor was Dr. Richard N. Zare. [2] He died of cancer in 2013. [3]

Career

After earning his Ph.D., Jackson worked as part of the Gate Dielectric Group at Hewlett Packard Laboratories, and then joined Rockwell International's Rocketdyne division, [2] where he worked on polychrystalline diamond thin films. [4] In 1992, Jackson became the Associate Director at the Lawrence Berkeley National Laboratory's (LBNL) Center for X-ray Optics. [5] At LBNL, Jackson and his colleagues developed Python-based programming tools that helped physicists efficiently distribute data. One such tool, Py/Globus, was used to efficiently replicate data from the Laser Interferometer Gravitational-Wave Observatory to confirm Albert Einstein’s General Theory of Relativity. [3]

His research areas included ultraviolet lithography, synchrotron radiation, fabrication of high aspect ratio microstructures, and imaging studies of extreme ultraviolet masks. [5]

Jackson joined Florida A&M University as Vice President of Research and Professor of Physics in 2005, and in 2010, he began working at Morgan State University, as the chairperson of the physics department. [1]

Jackson was a former president of the National Society of Black Physicists (NSBP), [6] as well as an NSBP fellow. [7]

Selected publications

Related Research Articles

Photolithography is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer.

<span class="mw-page-title-main">Photoresist</span> Light-sensitive material used in making electronics

A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry.

<span class="mw-page-title-main">Excimer laser</span> Type of ultraviolet laser important in chip manufacturing and eye surgery

An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining.

<span class="mw-page-title-main">Photomask</span> Photolithographic Tool

A photomask is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits to produce a pattern on a thin wafer of material. In semiconductor manufacturing, a mask is sometimes called a reticle.

<span class="mw-page-title-main">Electron-beam lithography</span> Lithographic technique that uses a scanning beam of electrons

Electron-beam lithography is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

<span class="mw-page-title-main">Extreme ultraviolet lithography</span> Lithography using 13.5 nm UV light

Extreme ultraviolet lithography is a cutting-edge technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses extreme ultraviolet (EUV) light to create intricate patterns on silicon wafers.

<span class="mw-page-title-main">MSSTA</span> Sounding rocket payload built by A.B.C. Walker, Jr.

The Multi-spectral solar telescope array, or MSSTA, was a sounding rocket payload built by Professor A.B.C. Walker, Jr. at Stanford University in the 1990s to test EUV/XUV imaging of the Sun using normal incidence EUV-reflective multilayer optics. MSSTA contained a large number of individual telescopes, all trained on the Sun and all sensitive to slightly different wavelengths of ultraviolet light. Like all sounding rockets, MSSTA flew for approximately 14 minutes per mission, about 5 minutes of which were in space—just enough time to test a new technology or yield "first results" science. MSSTA is one of the last solar observing instruments to use photographic film rather than a digital camera system such as a CCD. MSSTA used film instead of a CCD in order to achieve the highest possible spatial resolution and to avoid the electronics difficulty presented by the large number of detectors that would have been required for its many telescopes.

<span class="mw-page-title-main">Extreme ultraviolet</span> Ultraviolet light with a wavelength of 10–121nm

Extreme ultraviolet radiation or high-energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter that the hydrogen Lyman-alpha line from 121 nm down to the X-ray band of 10 nm, and therefore having photons with energies from 10.26 eV up to 124.24 eV. EUV is naturally generated by the solar corona and artificially by plasma, high harmonic generation sources and synchrotron light sources. Since UVC extends to 100 nm, there is some overlap in the terms.

<span class="mw-page-title-main">Multiple patterning</span> Technique used to increase the number of structures a microchip may contain

Multiple patterning is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls would be necessary.

<span class="mw-page-title-main">Anthony M. Johnson</span> American physicist, ultrafast optics (born 1954)

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The argon fluoride laser is a particular type of excimer laser, which is sometimes called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. "Excimer" is short for "excited dimer", while "exciplex" is short for "excited complex". An excimer laser typically uses a mixture of a noble gas and a halogen gas, which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation in the ultraviolet range.

In semiconductor manufacturing, the "7 nm" process is a marketing term for the MOSFET technology node following the "10 nm" node, defined by the International Technology Roadmap for Semiconductors. It is based on FinFET technology, a type of multi-gate MOSFET technology.

<span class="mw-page-title-main">Hakeem Oluseyi</span> American astrophysicist (born 1967)

Hakeem Muata Oluseyi is an American astrophysicist, cosmologist, inventor, educator, science communicator, author, actor, veteran, and humanitarian.

Deborah J. Jackson is an American physicist and Program Manager at the National Science Foundation, and a Fellow of the National Society of Black Physicists. She was the first African American woman to receive a Ph.D. in physics from Stanford University. She is an expert on "electromagnetic phenomena" with a research and development career that spans the full range of the electromagnetic spectrum from materials studies using hard x-ray wavelengths, to nonlinear optics and spectroscopy in the near-infrared, to the fielding of radio frequency instrumentation on deep space missions such as Cassini and Mars Observer.

<span class="mw-page-title-main">Willie Rockward</span> American academic

Willie S. Rockward is a physics professor and has served as the chair of the department of physics and engineering physics at Morgan State University since August of 2018. His research interests include Micro/Nano Optics Lithography, Extreme Ultraviolet Interferometry, Metamaterials, Terahertz imaging, Nanostructure Characterization, and Crossed Phase Optics. From 2018 to 2020 he was the president of the National Society of Black Physicists.

Peter J. Delfyett Jr is an American engineer and Pegasus Professor and Trustee Chair Professor of Optics, ECE & Physics at the University of Central Florida College of Optics and Photonics.

Regina Soufli is a Greek-American physicist and a staff scientist at Lawrence Livermore National Laboratory, in Livermore, California, where she works on the development and the characterization of materials and thin-film coatings for extreme ultraviolet (EUV) and X-ray applications. The results of her work is the heart of the reflective optics used in EUV lithography, the next-generation in semiconductor manufacturing technology, in satellites such as NASA's Solar Dynamics Observatory, or on optics for Free-electron lasers such as the Linac Coherent Light Source at SLAC National Accelerator Laboratory.

David Attwood is an American physicist and professor emeritus at the University of California, Berkeley, where he worked in the field of synchrotron radiation and free-electron lasers, developing X-ray microscopy techniques for research and for the industry. He is the author of a reference book on soft X-rays and extreme ultraviolet radiation.

Saša Bajt is a Slovenian scientist and group leader at the Deutsches Elektronen-Synchrotron, where she develops multi-layer mirrors for X-ray applications such as Laue lenses. . She is a regular collaborator of the European XFEL.

Carmen S. Menoni is an Argentine-American physicist who is the University Distinguished Professor at Colorado State University. Her research considers oxide materials for interference coatings and spectrometry imaging. She is a Fellow of the Institute of Electrical and Electronics Engineers, American Physical Society, Optica, and SPIE. Menoni served as the President of the IEEE Photonics Society from 2020 to 2021.

References

  1. 1 2 3 4 "Keith Jackson's Biography". The HistoryMakers. Retrieved 2023-10-27.
  2. 1 2 Williams, Scott. "Physicists of the African Diaspora". Physicists of the African Diaspora. Retrieved October 27, 2023.
  3. 1 2 scyang (2017-10-03). "How Berkeley Lab Software Helped Lead to the 2017 Nobel Prize in Physics - Berkeley Lab". Berkeley Lab News Center. Retrieved 2023-10-27.
  4. Thompson, Garland (January 1, 2004). "The 50-Most Important African-Americans in Technology". US Black Engineer and IT. p. 25.
  5. 1 2 "IEEE Explore". ieeexplore.ieee.org. Retrieved 2023-10-27.
  6. "NSBP History - National Society of Black Physicists". nsbp.org. Retrieved 2023-10-27.
  7. "NSBP Fellows - National Society of Black Physicists". nsbp.org. Retrieved 2023-10-27.