Laser chemical vapor deposition (LCVD) is a chemical process used to produce high purity, high performance films, fibers, and mechanical hardware (MEMS). It is a form of chemical vapor deposition in which a laser beam is used to locally heat the semiconductor substrate, causing the vapor deposition chemical reaction to proceed faster at that site. [1] The process is used in the semiconductor industry for spot coating, [2] the MEMS industry for 3-D printing of hardware such as springs and heating elements,2,6,7,9 and the composites industry for boron and ceramic fibers. [3] [4] [5] [6] [7] [8] [9] As with conventional CVD, one or more gas phase precursors are thermally decomposed, and the resulting chemical species 1) deposit on a surface, or 2) react, form the desired compound, and then deposit on a surface, or a combination of (1) and (2). [10] [11] [12]