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In physics, sputtering is a phenomenon in which microscopic particles of a solid material are ejected from its surface, after the material is itself bombarded by energetic particles of a plasma or gas. It occurs naturally in outer space, and can be an unwelcome source of wear in precision components. However, the fact that it can be made to act on extremely fine layers of material is utilised in science and industry—there, it is used to perform precise etching, carry out analytical techniques, and deposit thin film layers in the manufacture of optical coatings, semiconductor devices and nanotechnology products. It is a physical vapor deposition technique.
A getter is a deposit of reactive material that is placed inside a vacuum system, for the purpose of completing and maintaining the vacuum. When gas molecules strike the getter material, they combine with it chemically or by absorption. Thus the getter removes small amounts of gas from the evacuated space. The getter is usually a coating applied to a surface within the evacuated chamber.
A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering. Advances in thin film deposition techniques during the 20th century have enabled a wide range of technological breakthroughs in areas such as magnetic recording media, electronic semiconductor devices, Integrated passive devices, LEDs, optical coatings, hard coatings on cutting tools, and for both energy generation and storage. It is also being applied to pharmaceuticals, via thin-film drug delivery. A stack of thin films is called a multilayer.
Diamond-like carbon (DLC) is a class of amorphous carbon material that displays some of the typical properties of diamond. DLC is usually applied as coatings to other materials that could benefit from some of those properties.
A coating is a covering that is applied to the surface of an object, usually referred to as the substrate. The purpose of applying the coating may be decorative, functional, or both. The coating itself may be an all-over coating, completely covering the substrate, or it may only cover parts of the substrate. An example of all of these types of coating is a product label on many drinks bottles — one side has an all-over functional coating and the other side has one or more decorative coatings in an appropriate pattern to form the words and images.
Silvering is the chemical process of coating a non-conductive substrate such as glass with a reflective substance, to produce a mirror. While the metal is often silver, the term is used for the application of any reflective metal.
Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film. It is important that the bombardment be continuous between the cleaning and the deposition portions of the process to maintain an atomically clean interface.
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral. During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber with a thin layer of the anode material.
Vacuum deposition is a family of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure. The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings. The process can be qualified based on the vapor source; physical vapor deposition uses a liquid or solid source and chemical vapor deposition uses a chemical vapor.
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings. PVD is characterized by a process in which the material goes from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation. PVD is used in the manufacture of items which require thin films for mechanical, optical, chemical or electronic functions. Examples include semiconductor devices such as thin film solar panels, aluminized PET film for food packaging and balloons, and titanium nitride coated cutting tools for metalworking. Besides PVD tools for fabrication, special smaller tools have been developed.
Thermal spraying techniques are coating processes in which melted materials are sprayed onto a surface. The "feedstock" is heated by electrical or chemical means.
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV. The sputtered ions can ballistically fly from the target in straight lines and impact energetically on the substrates or vacuum chamber. Alternatively, at higher gas pressures, the ions collide with the gas atoms that act as a moderator and move diffusively, reaching the substrates or vacuum chamber wall and condensing after undergoing a random walk. The entire range from high-energy ballistic impact to low-energy thermalized motion is accessible by changing the background gas pressure. The sputtering gas is often an inert gas such as argon. For efficient momentum transfer, the atomic weight of the sputtering gas should be close to the atomic weight of the target, so for sputtering light elements neon is preferable, while for heavy elements krypton or xenon are used. Reactive gases can also be used to sputter compounds. The compound can be formed on the target surface, in-flight or on the substrate depending on the process parameters. The availability of many parameters that control sputter deposition make it a complex process, but also allow experts a large degree of control over the growth and microstructure of the film.
High-power impulse magnetron sputtering is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely high power densities of the order of kW⋅cm−2 in short pulses (impulses) of tens of microseconds at low duty cycle of < 10%. Distinguishing features of HIPIMS are a high degree of ionisation of the sputtered metal and a high rate of molecular gas dissociation which result in high density of deposited films. The ionization and dissociation degree increase according to the peak cathode power. The limit is determined by the transition of the discharge from glow to arc phase. The peak power and the duty cycle are selected so as to maintain an average cathode power similar to conventional sputtering (1–10 W⋅cm−2).
AVS: Science and Technology of Materials, Interfaces, and Processing is a not-for-profit learned society founded in 1953 focused on disciplines related to materials, interfaces, and processing. AVS has approximately 4500 members worldwide from academia, governmental laboratories and industry.
Plasma polymerization uses plasma sources to generate a gas discharge that provides energy to activate or fragment gaseous or liquid monomer, often containing a vinyl group, in order to initiate polymerization. Polymers formed from this technique are generally highly branched and highly cross-linked, and adhere to solid surfaces well. The biggest advantage to this process is that polymers can be directly attached to a desired surface while the chains are growing, which reduces steps necessary for other coating processes such as grafting. This is very useful for pinhole-free coatings of 100 picometers to 1 micrometre thickness with solvent insoluble polymers.
Ivan Georgiev Petrov is a Bulgarian-American physicist, specializing in thin films, surface science, and methods of characterization of materials. His research and scientific contributions have been described as having an "enormous impact on the hard-coatings community". Petrov was the president of the American Vacuum Society for 2015.
Jeffrey Elam is a senior chemist and group leader at the U.S. Department of Energy's Argonne National Laboratory. He leads Argonne's atomic layer deposition (ALD) research program, where he directs research and development and commercialization of thin film coating technologies for energy applications.
Joseph "Joe" E. Greene, known in his professional writing as J. E. Greene is an American materials scientist, specializing in thin films, crystal growth, surface science, and advanced surface engineering. His research and scientific contributions in these areas have been described as "pioneering" and "seminal" and that his work has "revolutionized the hard-coating industry".
References
- 1 2 3 4 5 6 "Form 990: Return of Organization Exempt From Income Tax for Year Ending 2017". ProPublica. Retrieved 2 October 2019.
- ↑ "SVC Mission and Vision". svc.org. Society of Vacuum Coaters. Retrieved 2 October 2019.
- 1 2 "Society of Vacuum Coaters - SVC Committees: Focus and Membership". svc.org. Society of Vacuum Coaters. Retrieved 3 October 2019.
- ↑ Mattox, Donald M.; Mattox, Vivivenne Harwood (2007). 50 Years of Vacuum Coating Technology and the Growth of the Society of Vacuum Coaters. Society of Vacuum Coaters. ISBN 978-1878068279.
- ↑ Mattox, Donald M (14 January 2004). The Foundations of Vacuum Coating Technology. William Andrew. ISBN 978-0815514954.
- ↑ Mattox, Donald M (2009). Education Guides to Vacuum Coating Processing. Society of Vacuum Coaters. ISBN 978-1878068286.
- ↑ "Home - Virtual". SVC TechCon. Retrieved 14 May 2021.
- ↑ " ". Society of Vacuum Coaters Annual Technical Conference Proceedings. ISSN 0737-5921.
