Chemical process modeling

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Chemical process modeling is a computer modeling technique used in chemical engineering process design. It typically involves using purpose-built software to define a system of interconnected components, [1] which are then solved so that the steady-state or dynamic behavior of the system can be predicted. The system components and connections are represented as a process flow diagram. [1] Simulations can be as simple as the mixing of two substances in a tank, or as complex as an entire alumina refinery. [2]

Contents

Chemical process modeling requires a knowledge of the properties of the chemicals involved in the simulation, [1] as well as the physical properties and characteristics of the components of the system, such as tanks, pumps, pipes, pressure vessels, and so on.

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Aspen HYSYS is a chemical process simulator used to mathematically model chemical processes, from unit operations to full chemical plants and refineries. HYSYS is able to perform many of the core calculations of chemical engineering, including those concerned with mass balance, energy balance, vapor-liquid equilibrium, heat transfer, mass transfer, chemical kinetics, fractionation, and pressure drop. HYSYS is used extensively in industry and academia for steady-state and dynamic simulation, process design, performance modelling, and optimization.

References

  1. 1 2 3 "Chemical process simulation : Processium, process simulation (chemical process simulation and conception)". Processium. Archived from the original on 2015-07-10. Retrieved 2017-06-24.
  2. Franco, Thiago; Seno Jr., Roberto; Moreno, Rodrigo; van Deursen, Caio; Freitas, Alexandre. "Process simulation in VM-CBA alumina refinery" (PDF). The International Committee for Study of Bauxite, Alumina & Aluminium. Archived from the original (PDF) on 2016-08-29. Retrieved 2017-06-24.