Ana M. Sanchez

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Ana Sanchez
Alma mater University of Cadiz
University of Granada
Scientific career
Institutions University of Liverpool
Centre National de la Recherche Scientifique

Ana M. Sanchez is a Spanish microscopist who is a professor at the University of Warwick. She works on the development of electron microscopy for the advanced characterisation of materials.

Contents

Early life and education

Sanchez studied chemical sciences at the University of Granada. [1] Sanchez studied gallium nitride heteroepitaxial systems for her doctoral research at the University of Cádiz. [1] She stayed at the University of Cádiz as an assistant professor for four years, before moving to the French National Centre for Scientific Research as a postdoctoral researcher in 2002. In 2003, she moved to the University of Liverpool, where she worked as a research fellow in materials science. [1]

Research and career

Sanchez works on advanced electron microscopy for condensed matter physics. She joined the University of Warwick in 2009, where she was a Science City Senior Research Fellow. At Warwick, she developed new strategies for semiconductor nanostructures; including functional oxides, 2D materials and van de Waals crystals. [2] She has studied the interface between ferro-electric and ferro-magnetic materials, showing that there was a special texture in ferroelectrics that matches the spin crystal phase of ferromagnets. [3] She showed that at the nanoscale ferromagnetic and ferroelectric materials had almost identical properties. [3]

Selected publications

Related Research Articles

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<span class="mw-page-title-main">Pyroelectricity</span> Voltage created when a crystal is heated

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<span class="mw-page-title-main">Aluminium nitride</span> Nitride of aluminum

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Epitaxy refers to a type of crystal growth or material deposition in which new crystalline layers are formed with one or more well-defined orientations with respect to the crystalline seed layer. The deposited crystalline film is called an epitaxial film or epitaxial layer. Epitaxial growth and semiconductor device fabrication are technologies used to develop stacked crystalline layers of different materials with specific semiconductor properties on a crystalline substrate, commonly silicon or silicon carbide (SiC) materials, to achieve the desired performance of the microelectronic devices, such as transistors and diodes. The crystal structure of these layers is with high density of imperfections, such as dislocations and stacking faults. Therefore the microelectronic engineers and technologists have developed different techniques to eliminate or minimize the density of these structural defects in order to improve the microelectronic devices operation. One such approach is Selective Area Growth technology.

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