Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.
MEMS is the technology of microscopic devices incorporating both electronic and moving parts. MEMS are made up of components between 1 and 100 micrometres in size, and MEMS devices generally range in size from 20 micrometres to a millimetre, although components arranged in arrays can be more than 1000 mm2. They usually consist of a central unit that processes data and several components that interact with the surroundings.
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips that are present in everyday electrical and electronic devices. It is a multiple-step photolithographic and physio-chemical process during which electronic circuits are gradually created on a wafer, typically made of pure single-crystal semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications.
A sphere is a geometrical object that is a three-dimensional analogue to a two-dimensional circle. Formally, a sphere is the set of points that are all at the same distance r from a given point in three-dimensional space. That given point is the centre of the sphere, and r is the sphere's radius. The earliest known mentions of spheres appear in the work of the ancient Greek mathematicians.
Electroplating, also known as electrochemical deposition or electrodeposition, is a process for producing a metal coating on a solid substrate through the reduction of cations of that metal by means of a direct electric current. The part to be coated acts as the cathode of an electrolytic cell; the electrolyte is a solution of a salt of the metal to be coated; and the anode is usually either a block of that metal, or of some inert conductive material. The current is provided by an external power supply.
A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering. Advances in thin film deposition techniques during the 20th century have enabled a wide range of technological breakthroughs in areas such as magnetic recording media, electronic semiconductor devices, integrated passive devices, LEDs, optical coatings, hard coatings on cutting tools, and for both energy generation and storage. It is also being applied to pharmaceuticals, via thin-film drug delivery. A stack of thin films is called a multilayer.
A rhinestone, paste or diamante is a diamond simulant originally made from rock crystal but since the 19th century from crystal glass or polymers such as acrylic.
Diamond-like carbon (DLC) is a class of amorphous carbon material that displays some of the typical properties of diamond. DLC is usually applied as coatings to other materials that could benefit from such properties.
Titanium nitride is an extremely hard ceramic material, often used as a physical vapor deposition (PVD) coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.
Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
A tribometer is an instrument that measures tribological quantities, such as coefficient of friction, friction force, and wear volume, between two surfaces in contact. It was invented by the 18th century Dutch scientist Musschenbroek
Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a modified version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles called ions. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film. It is important that the bombardment be continuous between the cleaning and the deposition portions of the process to maintain an atomically clean interface. If this interface is not properly cleaned, then it can result into a weaker coating or poor adhesion.
Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber with a thin layer of the anode material.
Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure. The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings. The process can be qualified based on the vapor source; physical vapor deposition uses a liquid or solid source and chemical vapor deposition uses a chemical vapor.
Platit AG is a Swiss company that manufactures and markets coating equipment for the manufacturing cutting tool industry. It is one of the technology leaders in Physical vapor deposition coating technology .,
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation. PVD is used in the manufacturing of items which require thin films for optical, mechanical, electrical, acoustic or chemical functions. Examples include semiconductor devices such as thin-film solar cells, microelectromechanical devices such as thin film bulk acoustic resonator, aluminized PET film for food packaging and balloons, and titanium nitride coated cutting tools for metalworking. Besides PVD tools for fabrication, special smaller tools used mainly for scientific purposes have been developed.
Pyrolytic chromium carbide coating (PCC) is a technology for protection and reworking of rapidly wearing parts of manufacturing equipment working in extreme environmental conditions, using vacuum deposition technology. Coating mechanical parts can help with problems of corrosion, adhering, high-temperature and mechanical wear thus reducing unplanned repairs and loss of production.
Carbon films are thin film coatings which consist predominantly of the chemical element carbon. They include plasma polymer films, amorphous carbon films, CVD diamond films as well as graphite films.
Precision glass moulding is a replicative process that allows the production of high precision optical components from glass without grinding and polishing. The process is also known as ultra-precision glass pressing. It is used to manufacture precision glass lenses for consumer products such as digital cameras, and high-end products like medical systems. The main advantage over mechanical lens production is that complex lens geometries such as aspheres can be produced cost-efficiently.
Titanium aluminium nitride (TiAlN) or aluminium titanium nitride is a group of metastable hard coatings consisting of nitrogen and the metallic elements aluminium and titanium. This compound as well as similar compounds(such as TiN and TiCN) are most notably used for coating machine tools such and endmills and drills to change their properties, such as increased thermal stability and/or wear resistance. Four important compositions are deposited in industrial scale by physical vapor deposition methods:
