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In physics, sputtering is a phenomenon in which microscopic particles of a solid material are ejected from its surface, after the material is itself bombarded by energetic particles of a plasma or gas. It occurs naturally in outer space, and can be an unwelcome source of wear in precision components. However, the fact that it can be made to act on extremely fine layers of material is utilised in science and industry—there, it is used to perform precise etching, carry out analytical techniques, and deposit thin film layers in the manufacture of optical coatings, semiconductor devices and nanotechnology products. It is a physical vapor deposition technique.
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Hafnium(IV) chloride is the inorganic compound with the formula HfCl4. This colourless solid is the precursor to most hafnium organometallic compounds. It has a variety of highly specialized applications, mainly in materials science and as a catalyst.
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Richard Magee Osgood Jr. was an American applied and pure physicist. He was Higgins Professor of Electrical Engineering and Applied Physics at Columbia University.
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Irving Philip Herman is an American physicist and the Edwin Howard Armstrong Professor of Applied Physics at Columbia University. He is an elected Fellow of the American Physical Society and of Optica, the former for "distinguished accomplishments in laser physics, notably the development and application of laser techniques to probe and control materials processing".
Hafnium compounds are compounds containing the element hafnium (Hf). Due to the lanthanide contraction, the ionic radius of hafnium(IV) (0.78 ångström) is almost the same as that of zirconium(IV) (0.79 angstroms). Consequently, compounds of hafnium(IV) and zirconium(IV) have very similar chemical and physical properties. Hafnium and zirconium tend to occur together in nature and the similarity of their ionic radii makes their chemical separation rather difficult. Hafnium tends to form inorganic compounds in the oxidation state of +4. Halogens react with it to form hafnium tetrahalides. At higher temperatures, hafnium reacts with oxygen, nitrogen, carbon, boron, sulfur, and silicon. Some compounds of hafnium in lower oxidation states are known.
References
- ↑ Chang, Jane Pei-chen (1998). Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterned polysilicon (Thesis). Massachusetts Institute of Technology. hdl:1721.1/50356. OCLC 39171343.
- 1 2 Ellis, Gordon (September 29, 2021). "Meet Some of AIChE's Recently Elected Fellows". www.aiche.org. American Institute of Chemical Engineers.
- 1 2 Chang, Jane P.; Lin, You-Sheng (2001-09-15). "Highly conformal ZrO2 deposition for dynamic random access memory application". Journal of Applied Physics. 90 (6). AIP Publishing: 2964–2969. doi:10.1063/1.1389756. ISSN 0021-8979.
- 1 2 Lin, Y.-S.; Puthenkovilakam, R.; Chang, J. P. (2002-09-09). "Dielectric property and thermal stability of HfO2 on silicon". Applied Physics Letters . 81 (11). AIP Publishing: 2041–2043. doi:10.1063/1.1506207. ISSN 0003-6951.
- 1 2 Tanner, Carey M.; Perng, Ya-Chuan; Frewin, Christopher; Saddow, Stephen E.; Chang, Jane P. (2007-11-12). "Electrical performance of Al2O3 gate dielectric films deposited by atomic layer deposition on 4H-SiC". Applied Physics Letters. 91 (20). AIP Publishing. doi:10.1063/1.2805742. ISSN 0003-6951.
- ↑ Bodderas, Elke (November 6, 2010). "Das Körnchen ist ein Akku" (in German). Berlin: Die Welt. ProQuest 762553092.
- ↑ "AVS Election Winners | Biography: Jane P. Chang". avs.org. Retrieved October 25, 2024.
- ↑ "Professor Jane Chang receives 2018 AVS Plasma Prize". UCLA Samueli Chemical & Biomolecular Engineering. November 7, 2018.
- ↑ "CAREER: Plasma and Surface Chemistry in Depositing and Etching Metal Oxides". www.nsf.gov. April 1, 2000. Retrieved October 23, 2024.
- ↑ "Fellow of the Society | List of Fellows". avs.org. AVS Science and Technology of Materials, Interfaces, and Processing . Retrieved October 23, 2024.
- ↑ "Plasma Science & Technology Division Plasma Prize | Past Winners". avs.org. AVS Science and Technology of Materials, Interfaces, and Processing . Retrieved October 23, 2024.