Microstructured optical arrays

Last updated

Microstructured optical arrays (MOAs) are instruments for focusing x-rays. MOAs use total external reflection at grazing incidence from an array of small channels to bring x-rays to a common focus. This method of focusing means that MOAs exhibit low absorption. MOAs are used in applications which require x-ray focal spots in the order of few micrometers or below, such as radiobiology of individual cells. Current MOA-based focusing optics designs have two consecutive array components in order to reduce comatic aberration.

Contents

Properties

Fig. 1- MOA with second component compressed MOA config 1.jpg
Fig. 1- MOA with second component compressed

MOAs are achromatic (which means the focal properties do not change for radiation of different wavelengths) as they utilize grazing incidence reflection. This means that they are able to focus chromatic radiation to a common point unlike zone plates. MOAs are also adjustable as the optic can be compressed to alter the focal properties such as focal length. Focal length can be calculated for the system in fig. 1 using the geometry shown in fig. 2 where it can be seen that changing the gap between the components (d+D in the figure) or the radius of curvature (R) will have a large effect on the focal length.

Fig. 2- Geometry of MOA in configuration shown in fig. 1 MOA config 1 geometry2.jpg
Fig. 2- Geometry of MOA in configuration shown in fig. 1

MOAs have been used in configurations shown in figs. 1 & 3 whereby one or both components can be adjusted. This has varying effects on the focal properties, in general it has been found that smaller focal spot sizes are apparent when MOAs are used as shown in fig. 1 with only the second component adjusted.

Fig. 3- MOA with both components compressed MOA config 2.jpg
Fig. 3- MOA with both components compressed

The focal length of this system can be calculated using the geometry shown below:

Fig. 4- Geometry of MOA in configuration shown in fig. 2 MOA config 2 geometry.jpg
Fig. 4- Geometry of MOA in configuration shown in fig. 2

Manufacturing

Current microstructured optical arrays are composed of silicon and created via the Bosch process, [1] an example of Deep reactive ion etching and not to be confused with the Haber–Bosch process. In the Bosch process the channels are etched into the silicon using a plasma (plasma (physics)) in increments of a few micrometres. In between each etching the silicon is coated with a polymer in order to preserve the integrity of the channel walls.

Applications

The focal spot size is important in x-ray microprobe instrumentation where x-rays are focused onto a biological sample to investigate phenomena such as the bystander effect. [2]

To target a specific cell the focal spot size of the system must be around 10 micrometers, whereas to target specific areas of a cell such as the cytoplasm or the cell nucleus it should be no more than a few micrometers. Currently, only MOAs in the configuration shown in fig. 1 are thought to be able to achieve this. [3]

MOAs provide a good alternative to zone plates in microprobe use due to the adjustable focal properties (making cell alignment easier) and ability to provide focusing of chromatic radiation to a single point. This is particularly useful when considering the finding that different effects can be observed using radiation of different wavelengths. [4]

Related Research Articles

Microelectromechanical systems Very small devices that incorporate moving components

Microelectromechanical systems (MEMS), also written as micro-electro-mechanical systems and the related micromechatronics and microsystems constitute the technology of microscopic devices, particularly those with moving parts. They merge at the nanoscale into nanoelectromechanical systems (NEMS) and nanotechnology. MEMS are also referred to as micromachines in Japan and microsystem technology (MST) in Europe.

Optics Branch of physics that studies light

Optics is the branch of physics that studies the behaviour and properties of light, including its interactions with matter and the construction of instruments that use or detect it. Optics usually describes the behaviour of visible, ultraviolet, and infrared light. Because light is an electromagnetic wave, other forms of electromagnetic radiation such as X-rays, microwaves, and radio waves exhibit similar properties.

X-ray fluorescence Physical phenomenom

X-ray fluorescence (XRF) is the emission of characteristic "secondary" X-rays from a material that has been excited by being bombarded with high-energy X-rays or gamma rays. The phenomenon is widely used for elemental analysis and chemical analysis, particularly in the investigation of metals, glass, ceramics and building materials, and for research in geochemistry, forensic science, archaeology and art objects such as paintings

Gallium arsenide Chemical compound

Gallium arsenide (GaAs) is a III-V direct band gap semiconductor with a zinc blende crystal structure.

Transmission electron microscopy Technique in microscopy

Transmission electron microscopy (TEM) is a microscopy technique in which a beam of electrons is transmitted through a specimen to form an image. The specimen is most often an ultrathin section less than 100 nm thick or a suspension on a grid. An image is formed from the interaction of the electrons with the sample as the beam is transmitted through the specimen. The image is then magnified and focused onto an imaging device, such as a fluorescent screen, a layer of photographic film, or a sensor such as a scintillator attached to a charge-coupled device.

X-ray microscope

An X-ray microscope uses electromagnetic radiation in the soft X-ray band to produce magnified images of objects. Since X-rays penetrate most objects, there is no need to specially prepare them for X-ray microscopy observations.

A microprobe is an instrument that applies a stable and well-focused beam of charged particles to a sample.

Photodetector sensors of light or other electromagnetic energy

Photodetectors, also called photosensors, are sensors of light or other electromagnetic radiation. There is a wide variety of photodetectors which may be classified by mechanism of detection, such as photoelectric or photochemical effects, or by various performance metrics, such as spectral response. Semiconductor-based photodetectors typically have a p–n junction that converts light photons into current. The absorbed photons make electron–hole pairs in the depletion region. Photodiodes and phototransistors are a few examples of photodetectors. Solar cells convert some of the light energy absorbed into electrical energy.

Electron microprobe Instrument for the micro-chemical analysis of solids

An electron microprobe (EMP), also known as an electron probe microanalyzer (EPMA) or electron micro probe analyzer (EMPA), is an analytical tool used to non-destructively determine the chemical composition of small volumes of solid materials. It works similarly to a scanning electron microscope: the sample is bombarded with an electron beam, emitting x-rays at wavelengths characteristic to the elements being analyzed. This enables the abundances of elements present within small sample volumes to be determined, when a conventional accelerating voltage of 15-20 kV is used. The concentrations of elements from lithium to plutonium may be measured at levels as low as 100 parts per million (ppm), material dependent, although with care, levels below 10 ppm are possible The ability to quantify lithium by EPMA became a reality in 2008.

Electronic component Discrete device in an electronic system

An electronic component is any basic discrete device or physical entity in an electronic system used to affect electrons or their associated fields. Electronic components are mostly industrial products, available in a singular form and are not to be confused with electrical elements, which are conceptual abstractions representing idealized electronic components and elements.

Metallography

Metallography is the study of the physical structure and components of metals, by using microscopy.

Deep reactive-ion etching (DRIE) is a highly anisotropic etch process used to create deep penetration, steep-sided holes and trenches in wafers/substrates, typically with high aspect ratios. It was developed for microelectromechanical systems (MEMS), which require these features, but is also used to excavate trenches for high-density capacitors for DRAM and more recently for creating through silicon vias (TSVs) in advanced 3D wafer level packaging technology. In DRIE, the substrate is placed inside a reactor, and several gases are introduced. A plasma is struck in the gas mixture which breaks the gas molecules into ions. The ions accelerated towards, and react with the surface of the material being etched, forming another gaseous element. This is known as the chemical part of the reactive ion etching. There is also a physical part, if ions have enough energy, they can knock atoms out of the material to be etched without chemical reaction.

Microfabrication

Microfabrication is a technique that use semiconductor manufacturing processes such as ion etching, diffusion, oxidation, sputtering etc. in combination with specialized micromachining techniques. This machining occurs in the range of 1-100 micrometers in size, where both the mechanical parts and the electronics that control them are built in the same piece of silicon. MEMS Fabrication consists in the application of the following steps, normally several times during the manufacturing. The process starts with a polished silicon – the substrate wafer that undergoes these steps such as Thin film growth or Deposition, Doping, Lithography and etching and Micromachining.

LIGA

LIGA is a German acronym for Lithographie, Galvanoformung, Abformung that describes a fabrication technology used to create high-aspect-ratio microstructures.

Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber with a thin layer of the anode material.

Radiobiology is a field of clinical and basic medical sciences that involves the study of the action of ionizing radiation on living things, especially health effects of radiation. Ionizing radiation is generally harmful and potentially lethal to living things but can have health benefits in radiation therapy for the treatment of cancer and thyrotoxicosis. Its most common impact is the induction of cancer with a latent period of years or decades after exposure. High doses can cause visually dramatic radiation burns, and/or rapid fatality through acute radiation syndrome. Controlled doses are used for medical imaging and radiotherapy.

Black silicon is a semiconductor material, a surface modification of silicon with very low reflectivity and correspondingly high absorption of visible light.

A microbeam is a narrow beam of radiation, of micrometer or sub-micrometer dimensions. Together with integrated imaging techniques, microbeams allow precisely defined quantities of damage to be introduced at precisely defined locations. Thus, the microbeam is a tool for investigators to study intra- and inter-cellular mechanisms of damage signal transduction.

Diffractive beam splitter

The diffractive beam splitter (also known as multispot beam generator or array beam generator) is a single optical element that divides an input beam into N output beams. Each output beam retains the same optical characteristics as the input beam, such as size, polarization and phase. A diffractive beam splitter can generate either a 1-dimensional beam array (1xN) or a 2-dimensional beam matrix (MxN), depending on the diffractive pattern on the element. The diffractive beam splitter is used with monochromatic light such as a laser beam, and is designed for a specific wavelength and angle of separation between output beams.

Three-dimensional (3D) microfabrication refers to manufacturing techniques that involve the layering of materials to produce a three-dimensional structure at a microscopic scale. These structures are usually on the scale of micrometers and are popular in microelectronics and microelectromechanical systems.

References

  1. Kiihamäki, J.; Franssila, S. (1999). "Pattern shape effects and artefacts in deep silicon etching". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. American Vacuum Society. 17 (4): 2280–2285. doi:10.1116/1.581761. ISSN   0734-2101.
  2. Little, M.P.; Filipe, J.A.N.; Prise, K.M.; Folkard, M.; Belyakov, O.V. (2005). "A model for radiation-induced bystander effects, with allowance for spatial position and the effects of cell turnover". Journal of Theoretical Biology. Elsevier BV. 232 (3): 329–338. doi:10.1016/j.jtbi.2004.08.016. ISSN   0022-5193. PMID   15572058.
  3. Michette, A. G.; Pfauntsch, S. J.; Powell, A. K.; Graf, T.; Losinski, D.; et al. (2003). "Progress with the King's College Laboratory scanning X-ray microscope". Journal de Physique IV (Proceedings). EDP Sciences. 104: 123–126. doi:10.1051/jp4:200300043. ISSN   1155-4339.
  4. Raju, M. R.; Carpenter, S. G.; Chmielewski, J. J.; Schillaci, M. E.; Wilder, M. E.; et al. (1987). "Radiobiology of Ultrasoft X Rays: I. Cultured Hamster Cells (V79)". Radiation Research. JSTOR. 110 (3): 396–412. doi:10.2307/3577007. ISSN   0033-7587. JSTOR   3577007. PMID   3588845.

5. Arndt Last. "Microstructured optical arrays". Archived from the original on 2009-11-24. Retrieved 22 Jan 2010.