Related Research Articles
In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate. The photoresist either breaks down or hardens where it is exposed to light. The patterned film is then created by removing the softer parts of the coating with appropriate solvents.
Ultraviolet (UV) is a form of electromagnetic radiation with wavelength shorter than that of visible light, but longer than X-rays. UV radiation is present in sunlight, and constitutes about 10% of the total electromagnetic radiation output from the Sun. It is also produced by electric arcs, Cherenkov radiation, and specialized lights, such as mercury-vapor lamps, tanning lamps, and black lights. Although long-wavelength ultraviolet is not considered an ionizing radiation because its photons lack the energy to ionize atoms, it can cause chemical reactions and causes many substances to glow or fluoresce. Many practical applications, including chemical and biological effects, derive from the way that UV radiation can interact with organic molecules. These interactions can involve absorption or adjusting energy states in molecules, but do not necessarily involve heating.
An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining. Since 1960s excimer lasers are widely used in high-resolution photolithography machines, one of the critical technologies required for microelectronic chip manufacturing.
An X-ray microscope uses electromagnetic radiation in the X-ray band to produce magnified images of objects. Since X-rays penetrate most objects, there is no need to specially prepare them for X-ray microscopy observations.
Extreme ultraviolet lithography is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma, to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist. It is currently applied only in the most advanced semiconductor device fabrication.
A krypton fluoride laser is a particular type of excimer laser, which is sometimes called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research. The term excimer is short for 'excited dimer', while exciplex is short for 'excited complex'. An excimer laser typically contains a mixture of: a noble gas such as argon, krypton, or xenon; and a halogen gas such as fluorine or chlorine. Under suitably intense conditions of electromagnetic stimulation and pressure, the mixture emits a beam of coherent stimulated radiation as laser light in the ultraviolet range.
Extreme ultraviolet radiation or high-energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter that the hydrogen Lyman-alpha line from 121 nm down to the X-Ray band of 10 nm, and therefore having photons with energies from 10.26 eV up to 124.24 eV. EUV is naturally generated by the solar corona and artificially by plasma, high harmonic generation sources and synchrotron light sources. Since UVC extends to 100 nm, there is some overlap in the terms.
The Advanced Light Source (ALS) is a research facility at Lawrence Berkeley National Laboratory in Berkeley, California. One of the world's brightest sources of ultraviolet and soft x-ray light, the ALS is the first "third-generation" synchrotron light source in its energy range, providing multiple extremely bright sources of intense and coherent short-wavelength light for use in scientific experiments by researchers from around the world. It is funded by the US Department of Energy (DOE) and operated by the University of California. In June 2018, Stephen Kevan became the director of the ALS.
Joachim Stöhr is a physicist and professor emeritus of the Photon Science Department of Stanford University. His research has focused on the development of X-ray and synchrotron radiation techniques and their applications in different scientific fields with emphasis on surface science and magnetism. During his career he also held several scientific leadership positions, such as the director of the Stanford Synchrotron Radiation Laboratory (SSRL) and he was the founding director of the Linac Coherent Light Source (LCLS), the world's first x-ray free electron laser.
Charles Stuart Bowyer was an American astronomer and academic. He was a professor at the University of California.
X-ray lithography is a process used in semiconductor device fabrication industry to selectively remove parts of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist, or simply "resist," on the substrate to reach extremely small topological size of a feature. A series of chemical treatments then engraves the produced pattern into the material underneath the photoresist.
The argon fluoride laser is a particular type of excimer laser, which is sometimes called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. "Excimer" is short for "excited dimer", while "exciplex" is short for "excited complex". An excimer laser typically uses a mixture of a noble gas and a halogen gas, which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation in the ultraviolet range.
Optica is an optical design program used for the design and analysis of both imaging and illumination systems. It works by ray tracing the propagation of rays through an optical system. It performs polarization ray-tracing, non-sequential ray-tracing, energy calculations, and optimization of optical systems in three-dimensional space. It also performs symbolic modeling of optical systems, diffraction, interference, wave-front, and Gaussian beam propagation calculations. In addition to conducting simulations of optical designs, Optica is used by scientists to create illustrations of the simulated results in publications. Some examples of Optica being used in simulations and illustrations include holography, x-ray optics, spectrometers, Cerenkov radiation, microwave optics, nonlinear optics, scattering, camera design, extreme ultraviolet lithography simulations, telescope optics, laser design, ultrashort pulse lasers, eye models, solar concentrators and Ring Imaging CHerenkov (RICH) particle detectors.
Johndale C. Solem is an American theoretical physicist and Fellow of Los Alamos National Laboratory. Solem has authored or co-authored over 185 technical papers in many different scientific fields. He is known for his work on avoiding comet or asteroid collisions with Earth and on interstellar spacecraft propulsion.
Regina Soufli is a Greek-America physicist and a staff scientist at Lawrence Livermore National Laboratory, in Livermore, California, where she works on the manufacturing and the characterization of materials and thin-film coatings for extreme ultraviolet (EUV) and X-ray application. The result of her work as the heart of the reflective optics used in EUV lithography, the next-generation in semiconductor manufacturing technology, in satellites such as NASA's Solar Dynamics Observatory, or on optics for Free-electron lasers such as the Linac Coherent Light Source at SLAC National Accelerator Laboratory.
Anne Sakdinawat is a physicist and a staff scientist at SLAC National Accelerator Laboratory, where her work focuses on the development on novel manufacturing techniques for nanoscale X-ray imaging. She is the co-author of a book on soft X-rays and extreme ultraviolet radiation.
Saša Bajt is a Slovenian scientist and group leader at the Deutsches Elektronen-Synchrotron, where she develops multi-layer mirrors for X-ray application such as Laue lenses. . She is a regular collaborator of the European XFEL.
Richard R. Freeman is an American physicist, academic and researcher. He is an affiliated professor of physics at the University of Washington, a distinguished emeritus professor of mathematical and physical science at Ohio State University, and an emeritus Edward Teller Professor of Applied Science at University of California, Davis.
The Extreme-ultraviolet Stellar Characterization for Atmospheric Physics and Evolution (ESCAPE) mission aims to find environments beyond Earth's solar system that might host planets with thick atmospheres to support life.
Jeffrey Bokor is an American electrical engineer.
References
- ↑ Attwood, D.; Halbach, K.; Kim, K.-J. (1985). "Tunable Coherent X-rays". Science. 228 (4705): 1265–1272. doi:10.1126/science.228.4705.1265. PMID 17799101. S2CID 27975164.
- ↑ Chao, Weilun; Harteneck, Bruce D.; Liddle, J. Alexander; Anderson, Erik H.; Attwood, David T. (2005). "Soft X-ray microscopy at a spatial resolution better than 15 nm". Nature. 435 (7046): 1210–1213. doi:10.1038/nature03719. PMID 15988520. S2CID 4314046.
- ↑ Gwyn, C. W. (1998). "Extreme ultraviolet lithography". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16 (6): 3142. doi:10.1116/1.590453.
- ↑ Attwood, David (1999). Soft X-Rays and Extreme Ultraviolet Radiation. Cambridge University Press Press. ISBN 9781139164429.
- ↑ David Attwood – Department of Electrical Engineering and Computer Sciences at UC Berkeley
- ↑ Attwood, D. T. (May 19, 1978). "Diagnostics for the laser fusion program: plasma physics on the scale of microns and picoseconds". OSTI 6683562 – via www.osti.gov.
- ↑ David Attwood – UC Berkeley
