Boron is a chemical element; it has symbol B and atomic number 5. In its crystalline form it is a brittle, dark, lustrous metalloid; in its amorphous form it is a brown powder. As the lightest element of the boron group it has three valence electrons for forming covalent bonds, resulting in many compounds such as boric acid, the mineral sodium borate, and the ultra-hard crystals of boron carbide and boron nitride.
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.
Fermium is a synthetic chemical element; it has symbol Fm and atomic number 100. It is an actinide and the heaviest element that can be formed by neutron bombardment of lighter elements, and hence the last element that can be prepared in macroscopic quantities, although pure fermium metal has not yet been prepared. A total of 20 isotopes are known, with 257Fm being the longest-lived with a half-life of 100.5 days.
Isotope separation is the process of concentrating specific isotopes of a chemical element by removing other isotopes. The use of the nuclides produced is varied. The largest variety is used in research. By tonnage, separating natural uranium into enriched uranium and depleted uranium is the largest application. In the following text, mainly uranium enrichment is considered. This process is crucial in the manufacture of uranium fuel for nuclear power plants, and is also required for the creation of uranium-based nuclear weapons. Plutonium-based weapons use plutonium produced in a nuclear reactor, which must be operated in such a way as to produce plutonium already of suitable isotopic mix or grade.
A fusor is a device that uses an electric field to heat ions to a temperature in which they undergo nuclear fusion. The machine induces a potential difference between two metal cages, inside a vacuum. Positive ions fall down this voltage drop, building up speed. If they collide in the center, they can fuse. This is one kind of an inertial electrostatic confinement device – a branch of fusion research.
Argonne National Laboratory is a federally funded research and development center in Lemont, Illinois, United States. Founded in 1946, the laboratory is owned by the United States Department of Energy and administered by UChicago Argonne LLC of the University of Chicago. The facility is the largest national laboratory in the Midwest.
Inertial electrostatic confinement, or IEC, is a class of fusion power devices that use electric fields to confine the plasma rather than the more common approach using magnetic fields found in magnetic confinement fusion (MCF) designs. Most IEC devices directly accelerate their fuel to fusion conditions, thereby avoiding energy losses seen during the longer heating stages of MCF devices. In theory, this makes them more suitable for using alternative aneutronic fusion fuels, which offer a number of major practical benefits and makes IEC devices one of the more widely studied approaches to fusion.
Experimental Breeder Reactor I (EBR-I) is a decommissioned research reactor and U.S. National Historic Landmark located in the desert about 18 miles (29 km) southeast of Arco, Idaho. It was the world's first breeder reactor. At 1:50 p.m. on December 20, 1951, it became one of the world's first electricity-generating nuclear power plants when it produced sufficient electricity to illuminate four 200-watt light bulbs. EBR-I subsequently generated sufficient electricity to power its building, and continued to be used for experimental purposes until it was decommissioned in 1964. The museum is open for visitors from late May until early September.
Ames National Laboratory, formerly Ames Laboratory, is a United States Department of Energy national laboratory located in Ames, Iowa, and affiliated with Iowa State University. It is a top-level national laboratory for research on national security, energy, and the environment. The laboratory conducts research into areas of national concern, including the synthesis and study of new materials, energy resources, high-speed computer design, and environmental cleanup and restoration. It is located on the campus of Iowa State University.
The Metallurgical Laboratory was a scientific laboratory at the University of Chicago that was established in February 1942 to study and use the newly discovered chemical element plutonium. It researched plutonium's chemistry and metallurgy, designed the world's first nuclear reactors to produce it, and developed chemical processes to separate it from other elements. In August 1942 the lab's chemical section was the first to chemically separate a weighable sample of plutonium, and on 2 December 1942, the Met Lab produced the first controlled nuclear chain reaction, in the reactor Chicago Pile-1, which was constructed under the stands of the university's old football stadium, Stagg Field.
The Bhabha Atomic Research Centre (BARC) is India's premier nuclear research facility, headquartered in Trombay, Mumbai, Maharashtra, India. It was founded by Homi Jehangir Bhabha as the Atomic Energy Establishment, Trombay (AEET) in January 1954 as a multidisciplinary research program essential for India's nuclear program. It operates under the Department of Atomic Energy (DAE), which is directly overseen by the Prime Minister of India.
Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors. These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. A thin film is slowly deposited through repeated exposure to separate precursors. ALD is a key process in fabricating semiconductor devices, and part of the set of tools for synthesizing nanomaterials.
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral. During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by radio frequency (RF) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.
A copper indium gallium selenide solar cell is a thin-film solar cell used to convert sunlight into electric power. It is manufactured by depositing a thin layer of copper indium gallium selenide solid solution on glass or plastic backing, along with electrodes on the front and back to collect current. Because the material has a high absorption coefficient and strongly absorbs sunlight, a much thinner film is required than of other semiconductor materials.
Polycrystalline silicon, or multicrystalline silicon, also called polysilicon, poly-Si, or mc-Si, is a high purity, polycrystalline form of silicon, used as a raw material by the solar photovoltaic and electronics industry.
Potential graphene applications include lightweight, thin, and flexible electric/photonics circuits, solar cells, and various medical, chemical and industrial processes enhanced or enabled by the use of new graphene materials.
Amorphous silicon (a-Si) is the non-crystalline form of silicon used for solar cells and thin-film transistors in LCDs.
Igor Serafimovich Tashlykov was a Soviet and Belarusian physicist, who was awarded the Doctor of Physical and Mathematical Sciences degree (1989). He was a member of the Belarusian Physical Society (1995). He carried out research at the Research Institute of Applied Physical Problems (APP) of the Belarusian State University, the Belarusian State Technological University, the Maxim Tank Belarusian State Pedagogical University (BSPU).
Jeffrey Elam is a Distinguished Fellow, Senior Chemist and Group Leader in the Applied Materials Division at the U.S. Department of Energy's Argonne National Laboratory. He leads Argonne's atomic layer deposition (ALD) research program, where he directs research and development and commercialization of thin film coating technologies for energy applications.
