In electronics, a latch-up is a type of short circuit which can occur in an integrated circuit (IC). More specifically, it is the inadvertent creation of a low-impedance path between the power supply rails of a MOSFET circuit, triggering a parasitic structure which disrupts proper functioning of the part, possibly even leading to its destruction due to overcurrent. A power cycle is required to correct this situation.
The parasitic structure is usually equivalent to a thyristor (or SCR), a PNPN structure which acts as a PNP and an NPN transistor stacked next to each other. During a latch-up when one of the transistors is conducting, the other one begins conducting too. They both keep each other in saturation for as long as the structure is forward-biased and some current flows through it - which usually means until a power-down. The SCR parasitic structure is formed as a part of the totem-pole PMOS and NMOS transistor pair on the output drivers of the gates.
The latch-up does not have to happen between the power rails - it can happen at any place where the required parasitic structure exists. A common cause of latch-up is a positive or negative voltage spike on an input or output pin of a digital chip that exceeds the rail voltage by more than a diode drop. Another cause is the supply voltage exceeding the absolute maximum rating, often from a transient spike in the power supply. It leads to a breakdown of an internal junction. This frequently happens in circuits which use multiple supply voltages that do not come up in the required sequence on power-up, leading to voltages on data lines exceeding the input rating of parts that have not yet reached a nominal supply voltage. Latch-ups can also be caused by an electrostatic discharge event.
Another common cause of latch-ups is ionizing radiation which makes this a significant issue in electronic products designed for space (or very high-altitude) applications. A single event latch-up is a latch-up caused by a single event upset, typically heavy ions or protons from cosmic rays or solar flares. [1] [2] Single-event latchup (SEL) can be completely eliminated by several manufacturing techniques, as part of radiation hardening. [3]
High-power microwave interference can also trigger latch ups. [4]
Both CMOS integrated circuits and TTL integrated circuits are more susceptible to latch-up at higher temperatures. [5]
All CMOS ICs have latch-up paths, but there are several design techniques that reduce susceptibility to latch-up. [6] [7] [8]
In CMOS technology, there are a number of intrinsic bipolar junction transistors. In CMOS processes, these transistors can create problems when the combination of n-well/p-well and substrate results in the formation of parasitic n-p-n-p structures. Triggering these thyristor-like devices leads to a shorting of the Vdd and GND lines, usually resulting in destruction of the chip, or a system failure that can only be resolved by power-down. [9]
Consider the n-well structure in the first figure. The n-p-n-p structure is formed by the source of the NMOS, the p-substrate, the n-well and the source of the PMOS. A circuit equivalent is also shown. When one of the two bipolar transistors gets forward biased (due to current flowing through the well, or substrate), it feeds the base of the other transistor. This positive feedback increases the current until the circuit fails or burns out.
The invention of the now industry-standard technique to prevent CMOS latch-up was made by Hughes Aircraft company in 1977. [10]
It is possible to design chips to be resistant to latch-up by adding a layer of insulating oxide (called a trench) that surrounds both the NMOS and the PMOS transistors. This breaks the parasitic silicon-controlled rectifier (SCR) structure between these transistors. Such parts are important in the cases where the proper sequencing of power and signals cannot be guaranteed, such as hot swap devices.
Devices fabricated in lightly doped epitaxial layers grown on heavily doped substrates are also less susceptible to latch-up. The heavily doped layer acts as a current sink where excess minority carriers can quickly recombine. [11]
Most silicon-on-insulator devices are inherently latch-up-resistant. [12] Latch-up is the low resistance connection between tub[ clarification needed ] and power supply rails.
Also to avoid the latch, a separate tap connection is put for each transistor. But this will increase the size of the device so fabs give a minimum space to put a tap, for example, 10 μm in 130 nm technology.[ clarification needed ]
In electronics, the metal–oxide–semiconductor field-effect transistor is a type of field-effect transistor (FET), most commonly fabricated by the controlled oxidation of silicon. It has an insulated gate, the voltage of which determines the conductivity of the device. This ability to change conductivity with the amount of applied voltage can be used for amplifying or switching electronic signals. The term metal–insulator–semiconductor field-effect transistor (MISFET) is almost synonymous with MOSFET. Another near-synonym is insulated-gate field-effect transistor (IGFET).
NMOS or nMOS logic uses n-type (-) MOSFETs to implement logic gates and other digital circuits.
Complementary metal–oxide–semiconductor is a type of metal–oxide–semiconductor field-effect transistor (MOSFET) fabrication process that uses complementary and symmetrical pairs of p-type and n-type MOSFETs for logic functions. CMOS technology is used for constructing integrated circuit (IC) chips, including microprocessors, microcontrollers, memory chips, and other digital logic circuits. CMOS technology is also used for analog circuits such as image sensors, data converters, RF circuits, and highly integrated transceivers for many types of communication.
Static random-access memory is a type of random-access memory (RAM) that uses latching circuitry (flip-flop) to store each bit. SRAM is volatile memory; data is lost when power is removed.
An insulated-gate bipolar transistor (IGBT) is a three-terminal power semiconductor device primarily forming an electronic switch. It was developed to combine high efficiency with fast switching. It consists of four alternating layers (P–N–P–N) that are controlled by a metal–oxide–semiconductor (MOS) gate structure.
A thyristor is a solid-state semiconductor device which can be thought of as being a highly robust and switchable diode, allowing the passage of current in one direction but not the other, often under control of a gate electrode, that is used in high power applications like inverters and radar generators. It usually consists of four layers of alternating P- and N-type materials. It acts as a bistable switch. There are two designs, differing in what triggers the conducting state. In a three-lead thyristor, a small current on its gate lead controls the larger current of the anode-to-cathode path. In a two-lead thyristor, conduction begins when the potential difference between the anode and cathode themselves is sufficiently large. The thyristor continues conducting until the voltage across the device is reverse-biased or the voltage is removed, or through the control gate signal on newer types.
A silicon controlled rectifier or semiconductor controlled rectifier is a four-layer solid-state current-controlling device. The name "silicon controlled rectifier" is General Electric's trade name for a type of thyristor. The principle of four-layer p–n–p–n switching was developed by Moll, Tanenbaum, Goldey, and Holonyak of Bell Laboratories in 1956. The practical demonstration of silicon controlled switching and detailed theoretical behavior of a device in agreement with the experimental results was presented by Dr Ian M. Mackintosh of Bell Laboratories in January 1958. The SCR was developed by a team of power engineers led by Gordon Hall and commercialized by Frank W. "Bill" Gutzwiller in 1957.
A TRIAC is a three-terminal electronic component that conducts current in either direction when triggered. The term TRIAC is a genericised trademark.
A power semiconductor device is a semiconductor device used as a switch or rectifier in power electronics. Such a device is also called a power device or, when used in an integrated circuit, a power IC.
In computer engineering, a logic family is one of two related concepts:
IC power-supply pins denote a voltage and current supply terminals in electric, electronics engineering, and in integrated circuit design. Integrated circuits (ICs) have at least two pins that connect to the power rails of the circuit in which they are installed. These are known as the power-supply pins. However, the labeling of the pins varies by IC family and manufacturer. The double subscript notation usually corresponds to a first letter in a given IC family (transistors) notation of the terminals.
An electronic component is any basic discrete electronic device or physical entity part of an electronic system used to affect electrons or their associated fields. Electronic components are mostly industrial products, available in a singular form and are not to be confused with electrical elements, which are conceptual abstractions representing idealized electronic components and elements. A datasheet for an electronic component is a technical document that provides detailed information about the component's specifications, characteristics, and performance.
A power MOSFET is a specific type of metal–oxide–semiconductor field-effect transistor (MOSFET) designed to handle significant power levels. Compared to the other power semiconductor devices, such as an insulated-gate bipolar transistor (IGBT) or a thyristor, its main advantages are high switching speed and good efficiency at low voltages. It shares with the IGBT an isolated gate that makes it easy to drive. They can be subject to low gain, sometimes to a degree that the gate voltage needs to be higher than the voltage under control.
In integrated circuits, depletion-load NMOS is a form of digital logic family that uses only a single power supply voltage, unlike earlier NMOS logic families that needed more than one different power supply voltage. Although manufacturing these integrated circuits required additional processing steps, improved switching speed and the elimination of the extra power supply made this logic family the preferred choice for many microprocessors and other logic elements.
Semiconductor device modeling creates models for the behavior of the electrical devices based on fundamental physics, such as the doping profiles of the devices. It may also include the creation of compact models, which try to capture the electrical behavior of such devices but do not generally derive them from the underlying physics. Normally it starts from the output of a semiconductor process simulation.
Grounded-gate NMOS, commonly known as ggNMOS, is an electrostatic discharge (ESD) protection device used within CMOS integrated circuits (ICs). Such devices are used to protect the inputs and outputs of an IC, which can be accessed off-chip and are therefore subject to ESD when touched. An ESD event can deliver a large amount of energy to the chip, potentially destroying input/output circuitry; a ggNMOS device or other ESD protective devices provide a safe path for current to flow, instead of through more sensitive circuitry. ESD protection by means of such devices or other techniques is important to product reliability: 35% of all IC failures in the field are associated with ESD damage.
In semiconductor electronics fabrication technology, a self-aligned gate is a transistor manufacturing approach whereby the gate electrode of a MOSFET is used as a mask for the doping of the source and drain regions. This technique ensures that the gate is naturally and precisely aligned to the edges of the source and drain.
A metal gate, in the context of a lateral metal–oxide–semiconductor (MOS) stack, is the gate electrode separated by an oxide from the transistor's channel – the gate material is made from a metal. In most MOS transistors since about the mid-1970s, the "M" for metal has been replaced by polysilicon, but the name remained.
PMOS or pMOS logic is a family of digital circuits based on p-channel, enhancement mode metal–oxide–semiconductor field-effect transistors (MOSFETs). In the late 1960s and early 1970s, PMOS logic was the dominant semiconductor technology for large-scale integrated circuits before being superseded by NMOS and CMOS devices.
A transmission gate (TG) is an analog gate similar to a relay that can conduct in both directions or block by a control signal with almost any voltage potential. It is a CMOS-based switch, in which PMOS passes a strong 1 but poor 0, and NMOS passes strong 0 but poor 1. Both PMOS and NMOS work simultaneously.