Trifluorosilane

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Trifluorosilane
SiHF3 13465-71-9.svg
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Names
IUPAC name
Trifluorosilane
Identifiers
3D model (JSmol)
ChemSpider
PubChem CID
  • InChI=1S/F3HSi/c1-4(2)3/h4H Yes check.svgY
    Key: WPPVEXTUHHUEIV-UHFFFAOYSA-N Yes check.svgY
  • InChI=1S/F3HSi/c1-4(2)3/h4H
    Key: ZDHXKXAHOVTTAH-UHFFFAOYAH
  • F[SiH](F)F
Properties
HF3Si
Molar mass 86.09 g/mol
AppearanceColorless gas
Density 1.86 g/cm3
Melting point −131 °C (−204 °F; 142 K)
Boiling point −97.5 °C (−143.5 °F; 175.7 K)
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).

Trifluorosilane is the chemical compound with the formula F 3 H Si. At standard temperature and pressure, trifluorosilane is a colorless gas. [1] Note that the free radical F 3 Si is often also referred to as trifluorosilane, although more properly referred to as trifluorosilyl.

Contents

Preparation

Trifluorosilane has been purified and separated by low-temperature high-vacuum distillation. One preparation method involves products of the reaction between SbF3 and HSiCl3. [2] HSiCl3 is obtained by copper catalyzed reaction between HCl and Silicon at 200-400 °C.

Formation has also been reported in certain etching operations of silicon. [3]

Properties

The electric dipole moment of trifluorosilane is 1.26 debye. [4] The length of the silicon to fluorine bond is 1.555 Å, Si-H length is 1.55 Å, and ∠FSiF is 110°. [5]

Related Research Articles

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<span class="mw-page-title-main">Trichlorosilane</span> Chemical compound

Trichlorosilane is an inorganic compound with the formula HCl3Si. It is a colourless, volatile liquid. Purified trichlorosilane is the principal precursor to ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a siloxane polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds.

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<span class="mw-page-title-main">Gold(III) chloride</span> Chemical compound

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<span class="mw-page-title-main">Carbon tetraiodide</span> Chemical compound

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<span class="mw-page-title-main">Silicon tetraiodide</span> Chemical compound

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<span class="mw-page-title-main">Silicon tetrabromide</span> Chemical compound

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<span class="mw-page-title-main">Silsesquioxane</span> Molecular compound with applications in ceramics

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Boron monofluoride or fluoroborylene is a chemical compound with formula BF, one atom of boron and one of fluorine. It was discovered as an unstable gas and only in 2009 found to be a stable ligand combining with transition metals, in the same way as carbon monoxide. It is a subhalide, containing fewer than the normal number of fluorine atoms, compared with boron trifluoride. It can also be called a borylene, as it contains boron with two unshared electrons. BF is isoelectronic with carbon monoxide and dinitrogen; each molecule has 14 electrons.

<span class="mw-page-title-main">Thiophosphoryl fluoride</span> Chemical compound

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<span class="mw-page-title-main">Methyldiborane</span> Chemical compound

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<span class="mw-page-title-main">Tris(trimethylsilyl)amine</span> Chemical compound

Tris(trimethylsilyl)amine is the simplest tris(trialkylsilyl)amine which are having the general formula (R3Si)3N, in which all three hydrogen atoms of the ammonia are replaced by trimethylsilyl groups (-Si(CH3)3). Tris(trimethylsilyl)amine has been for years in the center of scientific interest as a stable intermediate in chemical nitrogen fixation (i. e. the conversion of atmospheric nitrogen N2 into organic substrates under normal conditions).

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<span class="mw-page-title-main">Silanide</span> Anionic molecule derived from silane

A silanide is a chemical compound containing an anionic silicon(IV) centre, the parent ion being SiH−3. The hydrogen atoms can also be substituted to produced more complex derivative anions such as tris(trimethylsilyl)silanide (hypersilyl), tris(tert-butyl)silanide, tris(pentafluoroethyl)silanide, or triphenylsilanide. The simple silanide ion can also be called trihydridosilanide or silyl hydride.

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References

  1. Perry, Dale L. (2011-06-15). Handbook of Inorganic Compounds, Second Edition. CRC Press. ISBN   9781439814628.
  2. Zuckerman, J. J. (2009-09-17). Inorganic Reactions and Methods, The Formation of Bonds to Halogens. John Wiley & Sons. ISBN   9780470145388.
  3. Lippold, Marcus; Böhme, Uwe; Gondek, Christoph; Kronstein, Martin; Patzig-Klein, Sebastian; Weser, Martin; Kroke, Edwin (December 2012). "Etching Silicon with HF-HNO 3 -H 2 SO 4 /H 2 O Mixtures - Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si-F Surface Groups". European Journal of Inorganic Chemistry. 2012 (34): 5714–5721. doi:10.1002/ejic.201200674. ISSN   1434-1948 . Retrieved 2014-08-27.
  4. Ghosh, S. N.; Trambarulo, Ralph; Gordy, Walter (February 1953). "Electric Dipole Moments of Several Molecules from the Stark Effect". The Journal of Chemical Physics. 21 (2): 308–310. Bibcode:1953JChPh..21..308G. doi:10.1063/1.1698877.
  5. Sheridan, John; Gordy, Walter (1 March 1950). "Microwave Spectra and Molecular Constants of Trifluorosilane Derivatives. Si F 3 H, Si F 3 C H 3 , Si F 3 Cl, and Si F 3 Br". Physical Review. 77 (5): 719. Bibcode:1950PhRv...77..719S. doi:10.1103/PhysRev.77.719.

Further reading