| IUPAC name |
Silicon (IV) chloride
|Other names |
3D model (JSmol)
CompTox Dashboard (EPA)
|Molar mass||169.90 g/mol|
|Melting point||−68.74 °C (−91.73 °F; 204.41 K)|
|Boiling point||57.65 °C (135.77 °F; 330.80 K)|
|Solubility||soluble in benzene, toluene, chloroform, ether|
|Vapor pressure||25.9 kPa at 20 °C|
Std enthalpy of
|Safety data sheet||See: data page |
|R-phrases (outdated)||R14, R36/37/38|
|S-phrases (outdated)||(S2), S7/8, S26|
|NFPA 704 (fire diamond)|
| Silicon tetrafluoride |
| Carbon tetrachloride |
| Chlorosilane |
|Supplementary data page|
| Refractive index (n),|
Dielectric constant (εr), etc.
| Phase behaviour |
|UV, IR, NMR, MS|
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Silicon tetrachloride or tetrachlorosilane is the inorganic compound with the formula SiCl4. It is a colourless volatile liquid that fumes in air. It is used to produce high purity silicon and silica for commercial applications.
Silicon tetrachloride is prepared by the chlorination of various silicon compounds such as ferrosilicon, silicon carbide, or mixtures of silicon dioxide and carbon. The ferrosilicon route is most common.
In the laboratory, SiCl4 can be prepared by treating silicon with chlorine:
It was first prepared by Jöns Jakob Berzelius in 1823.
Brine can be contaminated with silica when the production of chlorine is a byproduct of a metal refining process from metal chloride ore. In rare occurrences, the silicon dioxide in silica is converted to silicon tetrachloride when the contaminated brine is electrolyzed.
Like other chlorosilanes, silicon tetrachloride reacts readily with water:
In contrast, carbon tetrachloride does not hydrolyze readily. The reaction can be noticed on exposure of the liquid to air, the vapour produces fumes as it reacts with moisture to give a cloud-like aerosol of hydrochloric acid.
With alcohols and ethanol it reacts to give tetramethyl orthosilicate and tetraethyl orthosilicate:
At higher temperatures homologues of silicon tetrachloride can be prepared by the reaction:
In fact, the chlorination of silicon is accompanied by the formation of Si2Cl6. A series of compounds containing up to six silicon atoms in the chain can be separated from the mixture using fractional distillation.
Silicon tetrachloride is a classic electrophile in its reactivity.It forms a variety of organosilicon compounds upon treatment with Grignard reagents and organolithium compounds:
Reduction with hydride reagents afford silane.
Silicon tetrachloride is used as an intermediate in the manufacture of polysilicon, a hyper pure form of silicon,since it has a boiling point convenient for purification by repeated fractional distillation. It is reduced to trichlorosilane (HSiCl3) by hydrogen gas in a hydrogenation reactor, and either directly used in the Siemens process or further reduced to silane (SiH4) and injected into a fluidized bed reactor. Silicon tetrachloride reappears in both these two processes as a by-product and is recycled in the hydrogenation reactor. Vapor phase epitaxy of reducing silicon tetrachloride with hydrogen at approximately 1250oC was done:
The produced polysilicon is used as wafers in large amounts by the photovoltaic industry for conventional solar cells made of crystalline silicon and also by the semiconductor industry.
Silicon tetrachloride can also be hydrolysed to fumed silica. High purity silicon tetrachloride is used in the manufacture of optical fibres. This grade should be free of hydrogen containing impurities like trichlorosilane. Optical fibres are made using processes like MCVD and OFD where silicon tetrachloride is oxidized to pure silica in the presence of oxygen.
Pollution from the production of silicon tetrachloride has been reported in China associated with the increased demand for photovoltaic cells that has been stimulated by subsidy programs.The MSDS notes that one should "avoid all contact! In all cases consult a doctor! ... inhalation causes sore throat and Burning sensation".
Silicon is a chemical element with the symbol Si and atomic number 14. It is a hard and brittle crystalline solid with a blue-grey metallic lustre; and it is a tetravalent metalloid and semiconductor. It is a member of group 14 in the periodic table: carbon is above it; and germanium, tin, and lead are below it. It is relatively unreactive. Because of its high chemical affinity for oxygen, it was not until 1823 that Jöns Jakob Berzelius was first able to prepare it and characterize it in pure form. Its melting and boiling points of 1414 °C and 3265 °C respectively are the second-highest among all the metalloids and nonmetals, being only surpassed by boron. Silicon is the eighth most common element in the universe by mass, but very rarely occurs as the pure element in the Earth's crust. It is most widely distributed in dusts, sands, planetoids, and planets as various forms of silicon dioxide (silica) or silicates. More than 90% of the Earth's crust is composed of silicate minerals, making silicon the second most abundant element in the Earth's crust after oxygen.
Silane is an inorganic compound with chemical formula, SiH4, making it a group 14 hydride. It is a colourless, pyrophoric gas with a sharp, repulsive smell, somewhat similar to that of acetic acid. Silane is of practical interest as a precursor to elemental silicon.
Trichlorosilane is an inorganic compound with the formula HSiCl3. It is a colourless, volatile liquid. Purified trichlorosilane is the principal precursor to ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a silicone polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds.
Tungsten(VI) fluoride, also known as tungsten hexafluoride, is an inorganic compound with the formula WF6. It is a toxic, corrosive, colorless gas, with a density of about 13 g/L (roughly 11 times heavier than air.) It is one of the densest known gases under standard conditions. WF6 is commonly used by the semiconductor industry to form tungsten films, through the process of chemical vapor deposition. This layer serves as a low-resistivity metallic "interconnect". It is one of seventeen known binary hexafluorides.
Chlorosilanes are a group of reactive, chlorine-containing chemical compounds, related to silane and used in many chemical processes. Each such chemical has at least one silicon-chlorine bond. Trichlorosilane is produced on the largest scale. The parent chlorosilane is Silicon tetrachloride.
Tantalum(V) chloride, also known as tantalum pentachloride, is an inorganic compound with the formula TaCl5. It takes the form of a white powder and is commonly used as a starting material in tantalum chemistry. It readily hydrolyzes to form tantalum(V) oxychloride (TaOCl3) and eventually tantalum pentoxide (Ta2O5); this requires that it be synthesised and manipulated under anhydrous conditions, using air-free techniques.
Hafnium(IV) chloride is the inorganic compound with the formula HfCl4. This colourless solid is the precursor to most hafnium organometallic compounds. It has a variety of highly specialized applications, mainly in materials science and as a catalyst.
Phosphoryl chloride (commonly called phosphorus oxychloride) is a colourless liquid with the formula POCl3. It hydrolyses in moist air releasing phosphoric acid and fumes of hydrogen chloride. It is manufactured industrially on a large scale from phosphorus trichloride and oxygen or phosphorus pentoxide. It is mainly used to make phosphate esters such as tricresyl phosphate.
Chloroplatinic acid (also known as hexachloroplatinic acid) is an inorganic compound with the formula [H3O]2[PtCl6](H2O)x (0≤x≤6). A red solid, it is an important commercial source of platinum, usually as an aqueous solution. Although often written in shorthand as H2PtCl6, it is the hydronium (H3O+) salt of the hexachloroplatinate anion (PtCl2−
6).. Hexachloroplatinic acid is highly hygroscopic.
Organosilicon compounds are organometallic compounds containing carbon–silicon bonds. Organosilicon chemistry is the corresponding science of their preparation and properties. Most organosilicon compounds are similar to the ordinary organic compounds, being colourless, flammable, hydrophobic, and stable to air. Silicon carbide is an inorganic compound.
Tellurium tetrachloride is the inorganic compound with the empirical formula TeCl4. The compound is volatile, subliming at 200 °C at 0.1 mmHg. Molten TeCl4 is ionic, dissociating into TeCl3+ and Te2Cl102−.
Binary silicon-hydrogen compounds are saturated chemical compounds with the empirical formula SiHn. All contain tetrahedral silicon and terminal hydrides. They only have Si–H and Si–Si single bonds. The bond lengths are 146.0 pm for a Si–H bond and 233 pm for a Si–Si bond. The structures of the silanes are analogues of the alkanes, starting with silane, SiH
4, the analogue of methane, continuing with disilane Si
6, the analogue of ethane, etc.
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS:NH3 (i.e. 16:1), usually results in lower stress nitride films.
Dimethyldichlorosilane is a tetrahedral, organosilicon compound with the formula Si(CH3)2Cl2. At room temperature it is a colorless liquid that readily reacts with water to form both linear and cyclic Si-O chains. Dimethyldichlorosilane is made on an industrial scale as the principal precursor to dimethylsilicone and polysilane compounds.
Polysilicon hydrides are polymers containing only silicon and hydrogen. They have the formula where 0.2 ≤ n ≤ 2.5 and x is the number of monomer units. The polysilicon hydrides are generally colorless or pale-yellow/ocher powders that are easily hydrolyzed and ignite readily in air. The surfaces of silicon prepared by MOCVD using silane (SiH4) consist of a polysilicon hydride.
Polysilicon halides are silicon-backbone polymeric solids. At room temperature, the polysilicon fluorides are colorless to yellow solids while the chlorides, bromides, and iodides are, respectively, yellow, amber, and red-orange. Polysilicon dihalides (perhalo-polysilenes) have the general formula (SiX2)n while the polysilicon monohalides (perhalo-polysilynes) have the formula (SiX)n, where X is F, Cl, Br, or I and n is the number of monomer units in the polymer.
Lead tetrachloride, also known as lead(IV) chloride, has the molecular formula PbCl4. It is a yellow, oily liquid which is stable below 0 °C, and decomposes at 50 °C. It has a tetrahedral configuration, with lead as the central atom. The Pb–Cl covalent bonds have been measured to be 247 pm and the bond energy is 243 kJ⋅mol−1.
Hexachlorodisilane is the inorganic compound with the chemical formula Si2Cl6, It is a colourless liquid that fumes in moist air. It has specialty applications in as a reagent and as a volatile precursor to silicon metal.
Chlorotrifluorosilane is an organic gaseous compound with formula SiClF3 composed of silicon, fluorine and chlorine.
Tris(trimethylsilyl)silane is the organosilicon compound with the formula (Me3Si)3SiH (where Me = CH3). It is a colorless liquid that is classified as a hydrosilane since it contains an Si-H bond. The compound is notable as having a weak Si-H bond, with a bond dissociation energy estimated at 84 kcal/mol. For comparison, the Si-H bond in trimethylsilane is 94 kcal/mol. With such a weak bond, the compound is used as a reagent to deliver hydrogen atoms. The compound has been described as an environmentally benign analogue of tributyltin hydride.