MEMS is the technology of microscopic devices incorporating both electronic and moving parts. MEMS are made up of components between 1 and 100 micrometres in size, and MEMS devices generally range in size from 20 micrometres to a millimetre, although components arranged in arrays can be more than 1000 mm2. They usually consist of a central unit that processes data and several components that interact with the surroundings.
Photolithography is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer.
A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry.
Electron-beam lithography is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
Polydimethylsiloxane (PDMS), also known as dimethylpolysiloxane or dimethicone, is a silicone polymer with a wide variety of uses, from cosmetics to industrial lubrication.
Nanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering of nanometer-scale structures on various materials.
Dip pen nanolithography (DPN) is a scanning probe lithography technique where an atomic force microscope (AFM) tip is used to create patterns directly on a range of substances with a variety of inks. A common example of this technique is exemplified by the use of alkane thiolates to imprint onto a gold surface. This technique allows surface patterning on scales of under 100 nanometers. DPN is the nanotechnology analog of the dip pen, where the tip of an atomic force microscope cantilever acts as a "pen", which is coated with a chemical compound or mixture acting as an "ink", and put in contact with a substrate, the "paper".
Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer.
Micropatterning is the art of miniaturisation of patterns. Especially used for electronics, it has recently become a standard in biomaterials engineering and for fundamental research on cellular biology by mean of soft lithography. It generally uses photolithography methods but many techniques have been developed.
George McClelland Whitesides is an American chemist and professor of chemistry at Harvard University. He is best known for his work in the areas of nuclear magnetic resonance spectroscopy, organometallic chemistry, molecular self-assembly, soft lithography, microfabrication, microfluidics, and nanotechnology. A prolific author and patent holder who has received many awards, he received the highest Hirsch index rating of all living chemists in 2011.
Microcontact printing is a form of soft lithography that uses the relief patterns on a master polydimethylsiloxane (PDMS) stamp or Urethane rubber micro stamp to form patterns of self-assembled monolayers (SAMs) of ink on the surface of a substrate through conformal contact as in the case of nanotransfer printing (nTP). Its applications are wide-ranging including microelectronics, surface chemistry and cell biology.
Ralph G. Nuzzo, born February 23, 1954, in Paterson, New Jersey, is an American chemist and professor. Nuzzo is a researcher in the chemistry of materials, including processes that occur at surfaces and interfaces. His work has led to new techniques for fabricating and manipulating materials at the nano scale level, including functional device structures for microelectronics, optics and chemical sensing.
Microlithography is a general name for any manufacturing process that can create a minutely patterned thin film of protective materials over a substrate, such as a silicon wafer, in order to protect selected areas of it during subsequent etching, deposition, or implantation operations. The term is normally used for processes that can reliably produce features of microscopic size, such as 10 micrometres or less. The term nanolithography may be used to designate processes that can produce nanoscale features, such as less than 100 nanometres.
![<span class="mw-page-title-main">PDMS stamp</span> Patterned silicone piece]](https://upload.wikimedia.org/wikipedia/commons/thumb/d/db/Sarfus.SoftLitho.Streptavidin.jpg/320px-Sarfus.SoftLitho.Streptavidin.jpg)
PDMS stamps are pieces of polydimethylsiloxane (PDMS), a silicone, that have been patterned usually against a master mold to form a relief pattern used in soft lithography. This PDMS stamp can be used in either its current form as a relief surface for techniques such as microcontact printing or can also be attached to an external source by tubing so that liquid may be passed through channels on its surface. In this second case it will often be laminated to a surface so that chemistry can be performed on that surface producing a pattern of the PDMS stamp on to the surface. Alternatively a PDMS stamp can be laminated to a second piece of PDMS to form a contained device. It is possible to pattern PDMS with nanometre resolution.
Bio-MEMS is an abbreviation for biomedical microelectromechanical systems. Bio-MEMS have considerable overlap, and is sometimes considered synonymous, with lab-on-a-chip (LOC) and micro total analysis systems (μTAS). Bio-MEMS is typically more focused on mechanical parts and microfabrication technologies made suitable for biological applications. On the other hand, lab-on-a-chip is concerned with miniaturization and integration of laboratory processes and experiments into single chips. In this definition, lab-on-a-chip devices do not strictly have biological applications, although most do or are amenable to be adapted for biological purposes. Similarly, micro total analysis systems may not have biological applications in mind, and are usually dedicated to chemical analysis. A broad definition for bio-MEMS can be used to refer to the science and technology of operating at the microscale for biological and biomedical applications, which may or may not include any electronic or mechanical functions. The interdisciplinary nature of bio-MEMS combines material sciences, clinical sciences, medicine, surgery, electrical engineering, mechanical engineering, optical engineering, chemical engineering, and biomedical engineering. Some of its major applications include genomics, proteomics, molecular diagnostics, point-of-care diagnostics, tissue engineering, single cell analysis and implantable microdevices.
The argon fluoride laser is a particular type of excimer laser, which is sometimes called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. "Excimer" is short for "excited dimer", while "exciplex" is short for "excited complex". An excimer laser typically uses a mixture of a noble gas and a halogen gas, which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation in the ultraviolet range.
Younan Xia is a Chinese-American chemist, materials scientist, and bioengineer. He is the Brock Family Chair and Georgia Research Alliance (GRA) Eminent Scholar in Nanomedicine in the Wallace H. Coulter Department of Biomedical Engineering, with joint appointments in the School of Chemistry & Biochemistry, the School of Chemical & Biomolecular Engineering, and Parker H. Petit Institute for Bioengineering & Bioscience at the Georgia Institute of Technology.
Nanosphere lithography (NSL) is an economical technique for generating single-layer hexagonally close packed or similar patterns of nanoscale features. Generally, NSL applies planar ordered arrays of nanometer-sized latex or silica spheres as lithography masks to fabricate nanoparticle arrays. NSL uses self-assembled monolayers of spheres as evaporation masks. These spheres can be deposited using multiple methods including Langmuir-Blodgett, dip coating, spin coating, solvent evaporation, force-assembly, and air-water interface. This method has been used to fabricate arrays of various nanopatterns, including gold nanodots with precisely controlled spacings.
Three-dimensional (3D) microfabrication refers to manufacturing techniques that involve the layering of materials to produce a three-dimensional structure at a microscopic scale. These structures are usually on the scale of micrometers and are popular in microelectronics and microelectromechanical systems.
