This is a list of semiconductor fabrication plants, factories where integrated circuits (ICs), also known as microchips, are manufactured. They are either operated by Integrated Device Manufacturers (IDMs) that design and manufacture ICs in-house and may also manufacture designs from design-only (fabless firms), or by pure play foundries that manufacture designs from fabless companies and do not design their own ICs. Some pure play foundries like TSMC offer IC design services, and others, like Samsung, design and manufacture ICs for customers, while also designing, manufacturing and selling their own ICs.
Operating fabs include:
Company | Plant name | Plant location | Plant cost (in US$ billions) | Started production | Wafer size (mm) | Process technology node (nm) | Production capacity (Wafers/Month) | Technology / products | |
---|---|---|---|---|---|---|---|---|---|
UMC – He Jian | Fab 8N | China, Suzhou | 0.750, [1] 1.2, +0.5 | 2003, May [1] | 200 | 4000–1000, 500, 350, 250, 180, 110 | 77,000 | Foundry | |
UMC | Fab 6A | Taiwan, Hsinchu | 0.35 [1] | 1989 [1] | 150 | 450 | 31,000 | Foundry | |
UMC | Fab 8AB | Taiwan, Hsinchu | 1 [1] | 1995 [1] | 200 | 250 | 67,000 [2] | Foundry | |
UMC | Fab 8C | Taiwan, Hsinchu | 1 [1] | 1998 [1] | 200 | 350–110 | 37,000 | Foundry | |
UMC | Fab 8D | Taiwan, Hsinchu | 1.5 [1] | 2000 [1] | 200 | 90 | 31,000 | Foundry | |
UMC | Fab 8E | Taiwan, Hsinchu | 0.96 [1] | 1998 [1] | 200 | 180 | 37,000 | Foundry | |
UMC | Fab 8F | Taiwan, Hsinchu | 1.5 [1] | 2000 [1] | 200 | 150 | 40,000 | Foundry | |
UMC | Fab 8S | Taiwan, Hsinchu | 0.8 [1] | 2004 [1] | 200 | 350–250 | 31,000 | Foundry | |
UMC | Fab 12A | Taiwan, Tainan | 4.65, 4.1, 6.6, 7.3 [1] | 2001, 2010, 2014, 2017 [1] | 300 | 28, 14 | 87,000 [2] | Foundry | |
UMC | Fab 12i | Singapore | 3.7 [1] | 2004 [1] | 300 | 130–40 | 53,000 | Foundry | |
UMC – United Semiconductor | Fab 12X | China, Xiamen | 6.2 | 2016 | 300 | 55–28 | 19,000-25,000 (2021) | Foundry | |
UMC – USJC (formerly MIFS)(formerly Fujitsu) | Fab 12M (original Fujitsu installations) [3] | Japan, Mie Prefecture | 1974 | 150, 200, 300 [4] | 90–40 | 33,000 | Foundry | ||
Texas Instruments | Miho | Japan, Ibaraki, Miho | 200 | 350, 250 [5] | 40,000 [6] | Analog, DLP [7] | |||
Texas Instruments (formerly Spansion) | Aizu [8] | Japan, Fukushima, Aizuwakamatsu | 200 | Analog | |||||
Texas Instruments (formerly National Semiconductor) | MFAB [9] | United States, Maine, South Portland | 0.932 | 1997 | 200 | 350, 250, 180 | Analog | ||
Texas Instruments (formerly Micron) (formerly IM Flash) | LFAB | United States, Utah, Lehi | 1.3 [10] (+ 3–4, future) [11] | 300 | 65–45 | 70,000 | Analog, mixed signal, logic NAND FLASH (former), 3D XPoint (former) | ||
Texas Instruments | RFAB1 [12] | United States, Texas, Richardson | 2009 | 300 | 250, 180 | 20,000 [13] | Analog | ||
Texas Instruments | RFAB2 | United States, Texas, Richardson | 2022 | 300 | Analog | ||||
Texas Instruments | DMOS5 | United States, Texas, Dallas | 1984 | 200 | 250, 180 | Analog, DLP | |||
Texas Instruments | DMOS6 | United States, Texas, Dallas | 2000 | 300 | 130–45 | 22,000 [14] | Logic, Analog | ||
Texas Instruments | DFAB | United States, Texas, Dallas | 1966 | 150, 200 | Mixed Signal, Analog | ||||
Texas Instruments | SFAB | United States, Texas, Sherman | 1965 | 150 | Analog | ||||
Texas Instruments | FFAB | Germany, Bavaria, Freising | 200 | 1000, 180 | 37,500 (450,000 per year) [15] | Analog | |||
Texas Instruments (formerly SMIC – Cension) | CFAB | China, Chengdu | 200 | 30,000 [16] | Analog | ||||
Tsinghua Unigroup [17] | China, Nanjing | 10 (first phase), 30 | Planned | 300 | 100,000 (first phase) | 3D NAND | |||
Tsinghua Unigroup – XMC (formerly Xinxin) [18] | Fab 1 | China, Wuhan [1] | 1.9 | 2008 | 300 | 90, 65, 60, 50, 45, 40, 32 | 30,000 [19] | Foundry, NOR | |
Tsinghua Unigroup – Yangtze Memory Technologies (YMTC) – XMC (formerly Xinxin) [18] [19] [17] | Fab 2 | China, Wuhan | 24 | 2018 [1] | 300 | 20 | 200,000 | 3D NAND | |
ChangXin Memory – (formerly Innotron Memory) | Fab 1 [20] | China, Hefei | 8 [21] | 2019 [22] | 300 | 19 | 20,000–40,000 | DRAM | |
SMIC | S1 Mega Fab (S1A/S1B/S1C) [23] | China, Shanghai | 200 | 350–90 | 115,000 [24] | Foundry | |||
SMIC | S2 (Fab 8) [23] | China, Shanghai | 300 | 45/40–32/28 | 20,000 | Foundry | |||
SMIC – SMSC | SN1 [23] | China, Shanghai | 10 | 2020 [25] | 300 | 14 | 70,000 [25] | Foundry | |
SMIC | B1 Mega Fab (Fab 4, Fab 6) [23] | China, Beijing | 2004 | 300 | 180–90/55 | 52,000 | Foundry | ||
SMIC | B2A [23] | China, Beijing | 3.59 [26] | 2014 | 300 | 45/40–32/28 | 41,000 | Foundry | |
SMIC | Fab 15 [23] | China, Shenzhen | 2014 | 200 | 350–90 | 55,000 | Foundry | ||
SMIC | Fab 7 [23] | China, Tianjin | 2004 | 200 | 350–90 | 60,000 [27] | Foundry | ||
SMIC | Jingcheng | China, Beijing | 7.7 [28] | Under construction | 300 | 28 | 100,000 | Foundry | |
SMIC | Lingang | China, Shanghai | 8.87 [29] | Under construction | 300 | 28 | 100,000 | Foundry | |
SMIC | Shenzhen | China, Shenzhen | 2.35 [30] | Under construction | 300 | 28 | 40,000 | Foundry | |
SMIC | Xiqing | China, Tianjin | 7.5 [31] | Under construction | 300 | 28 | 100,000 | Foundry | |
Wuxi Xichanweixin (formerly SMIC – LFoundry ) (formerly LFoundry )(formerly Micron) [32] (formerly Texas Instruments) | LF | Italy, Abruzzo, Avezzano | 1995 | 200 | 180–90 | 40,000 | |||
Nanya | Fab 2 | Taiwan, Linkou | 0.8 | 2000 | 200 [33] | 175 | 30,000 | DRAM | |
Nanya | Fab 3A [34] | Taiwan, New Taipei City [35] | 1.85 [36] | 2018 | 300 | 70-20 | 34,000 [37] | DRAM | |
Nanya | Taiwan, New Taipei City [38] | 10.66 | Under construction | 300 | 10 | 15,000–45,000 | DRAM | ||
MESA+ Institute | NANOLAB | Netherlands, Enschede | Academic research, R&D activities, pilot production for MEMS, Photonics, Microfluidics | ||||||
Micron | Fab 4 [39] | United States, Idaho, Boise | 300 | R&D | |||||
Micron (formerly Dominion Semiconductor) | Fab 6 | United States, Virginia, Manassas | 1997 | 300 | 25 | 70,000 | DRAM, NAND FLASH, NOR | ||
Micron (formerly TECH Semiconductor) | Fab 7 (formerly TECH Semiconductor, Singapore) [40] | Singapore | 300 | 60,000 | NAND FLASH | ||||
Micron (formerly IM Flash) [41] | Fab 10 [42] | Singapore | 3 | 2011 | 300 | 25 | 140,000 [43] | NAND FLASH | |
Micron (formerly Inotera) | Fab 11 [44] | Taiwan, Taoyuan | 300 | 20 and under | 125,000 [45] | DRAM | |||
Micron | Fab 13 [46] | Singapore | 200 | NOR | |||||
Micron | Singapore [47] | 200 | NOR Flash | ||||||
Micron | Micron Semiconductor Asia | Singapore [47] | |||||||
Micron | China, Xi'an [47] | ||||||||
Micron (formerly Elpida Memory) | Fab 15 (formerly Elpida Memory, Hiroshima) [39] [47] | Japan, Hiroshima | 300 | 20 and under | 100,000 | DRAM | |||
Micron (formerly Rexchip) | Fab 16 (formerly Rexchip, Taichung) [39] | Taiwan, Taichung | 300 | 30 and under | 80,000 | DRAM, FEOL | |||
Micron (formerly Cando) | Micron Memory Taiwan [47] | Taiwan, Taichung | ?, 2018 | 300 | DRAM, BEOL | ||||
Micron | A3 | Taiwan, Taichung [48] | Under construction | 300 | DRAM | ||||
Intel | D1B | United States, Oregon, Hillsboro | 1996 | 300 | 22, 14, 10 | Microprocessors [49] | |||
Intel | D1C [50] [49] | United States, Oregon, Hillsboro | 2001 | 300 | 22, 14, 10 | Microprocessors [49] | |||
Intel | D1D [50] [49] | United States, Oregon, Hillsboro | 2003 | 300 | 14, 10, 7 | Microprocessors [49] | |||
Intel | D1X [51] [49] | United States, Oregon, Hillsboro | 2013 | 300 | 14, 10, 7 | Microprocessors [49] | |||
Intel | Fab 12 [50] [49] | United States, Arizona, Chandler | 1996 | 300 | 65, 22, 14 | Microprocessors & chipsets [49] | |||
Intel | Fab 32 [50] [52] | United States, Arizona, Chandler | 3 | 2007 | 300 | 45 | |||
Intel | Fab 32 [50] [49] | United States, Arizona, Chandler | 2007 | 300 | 32, 22 | Microprocessors [49] | |||
Intel | Fab 42 [53] [54] [49] | United States, Arizona, Chandler | 10 [55] | 2020 [56] | 300 | 10, 7 | Microprocessors [49] | ||
Intel | Fab 52, 62 [57] [58] | United States, Arizona, Chandler | 20 [57] | 2024 [57] | Microprocessors [57] | ||||
Intel | Fab 11x [50] [49] | United States, New Mexico, Rio Rancho | 2002 | 300 | 45, 32 | Microprocessors [49] | |||
Intel (formerly Micron)(formerly Numonyx)(formerly Intel) | Fab 18 [59] | Israel, Southern District, Kiryat Gat | 1996 | 200, 300 | 180, 90, 65, 45 | Microprocessors and chipsets, [60] NOR flash | |||
Intel | Fab 10 [50] | Ireland, County Kildare, Leixlip | 1994 | 300 | |||||
Intel | Fab 14 [50] | Ireland, County Kildare, Leixlip | 1998 | 300 | |||||
Intel | Fab 24 [50] [49] | Ireland, County Kildare, Leixlip | 2004 | 300 | 90, 65, 14 [61] | Microprocessors, Chipsets and Comms [49] | |||
Intel | Fab 28 [50] [49] | Israel, Southern District, Kiryat Gat | 2008 | 300 | 45, 22, 10 | Microprocessors [49] | |||
Intel | Fab 38 [62] | Israel, Southern District, Kiryat Gat | Under construction | 300 | Microprocessors [49] | ||||
Intel | Fab 68 [50] [63] | China, Dalian | 2.5 | 2010 | 300 | 65 [64] | 30,000–52,000 | Microprocessors (former), VNAND [49] | |
Intel | Mega Lab | Costa Rica, Heredia, Belén | 1997, reopened in 2021 | 300 | 14 and under | Microprocessors and complex pacckaging. | |||
Smiths Interconnect | Costa Rica, Alajuela, Grecia | 2024 | 300 | Resistors, RF, microprocessors | |||||
Qorvo | Qorvo Costa Rica SRL | Costa Rica, Heredia, Barreal | 0.09 | 2020 | 300 | RF, IoT & microprocessors | |||
Costa Rican Ministry of Innovation, Science, Technology and Telecommunications | Centro de Exelencia, Distrito Tecnologico T24 | Costa Rica, San Jose, San Jose | 0.5 | Under Construction | 300 | 20 and under | Research on Foundry, AI BEOL & microprocessors | ||
Tower Semiconductor (formerly Maxim)(formerly Philips)(formerly VLSI) | Fab 9 [65] [66] | United States, Texas, San Antonio | 2003 | 200 | 180 | 28,000 | Foundry, Al BEOL, Power, RF Analog | ||
Tower Semiconductor (formerly National Semiconductor) | Fab 1 [67] | Israel, Northern District, Migdal HaEmek | 0.235 [1] | 1989, 1986 [1] | 150 | 1000–350 | 14,000 | Foundry, Planarized BEOL, W and Oxide CMP , CMOS, CIS, Power, Power Discrete | |
Tower Semiconductor | Fab 2 [67] | Israel, Northern District, Migdal HaEmek | 1.226 [1] | 2003 | 200 | 180–130 | 51,000 [1] | Foundry, Cu and Al BEOL, EPI, 193 nm Scanner, CMOS, CIS, Power, Power Discrete, MEMS, RFCMOS | |
Tower Semiconductor (formerly Jazz Technologies) (formerly Conexant)(formerly Rockwell) | Fab 3, [67] Newport Beach [1] | United States, California, Newport Beach | 0.165 [1] | 1967, 1995 [1] | 200 | 500-130 | 25,000 [1] | Foundry, Al BEOL, SiGe, EPI | |
Tower Semiconductor – TPSCo (formerly Panasonic) | Fab 5, [67] Tonami [68] | Japan, Tonami | 1994 | 200 | 500–130 | Foundry, Analog/Mixed-Signal, Power, Discrete, NVM, CCD | |||
Tower Semiconductor – TPSCo (formerly Panasonic) | Fab 7, [67] Uozu [68] | Japan, Uozu | 1984 | 300 | 65. 45 | Foundry, CMOS, CIS, RF SOI, Analog/Mixed-Signal | |||
Tower Semiconductor – TPSCo (formerly Panasonic) | Fab 6, [67] Arai [68] | Japan, Arai | 1976 | 200 | 130–110 | Foundry, Analog/Mixed-Signal, CIS, NVM,Thick Cu RDL | |||
Nuvoton [69] | Fab2 | Taiwan, Hsinchu | 150 | 1000-350 | 45,000 [69] | Generic Logic, Mixed Signal (Mixed Mode), High Voltage, Ultra High Voltage, Power Management, Mask ROM (Flat Cell), Embedded Logic, Non-Volatile Memory, IGBT, MOSFET, Biochip, TVS, Sensor | |||
ISRO | SCL [70] | India, Mohali | 2006 | 200 | 180 | MEMS, CMOS, CCD, N.S. | |||
STAR-C [71] [72] | MEMS [72] | India, Bangalore | 1996 | 150 | 1000–500 | MEMS | |||
STAR-C [71] [72] | CMOS [72] | India, Bangalore | 1996 | 150 | 1000–500 | CMOS | |||
GAETEC [71] [73] | GaAs [73] | India, Hyderabad | 1996 | 150 | 700–500 | MESFET | |||
BAE Systems (formerly Sanders) | United States, New Hampshire, Nashua [1] | 1985 [1] | 100, 150 | 140, 100, 70, 50 | MMIC, GaAs, GaN-on-SiC, foundry | ||||
Qorvo (formerly RF Micro Devices) | United States, North Carolina, Greensboro [74] | 100,150 | 500 | 8,000 | SAW filters, GaAs HBT, GaAs pHEMT, GaN | ||||
Qorvo (formerly TriQuint Semiconductor) (formerly Micron) (formerly Texas Instruments) (formerly TwinStar Semiconductor) | United States, Texas, Richardson [74] | 0.5 | 1996 | 100, 150, 200 | 350, 250, 150, 90 | 8,000 | DRAM (former), BAW filters, power amps, GaAs pHEMT, GaN-on-SiC | ||
Qorvo (formerly TriQuint Semiconductor) | United States, Oregon, Hillsboro [74] | 100, 150 | 500 | Power amps, GaAs | |||||
Apple (formerly Maxim)(formerly Samsung) | X3 [75] | United States, California, San Jose | ?, 1997, 2015 [76] | 600–90 | |||||
Analog Devices (formerly Maxim Integrated) | MaxFabNorth [77] | United States, Oregon, Beaverton | (+1, future) [78] | ||||||
Rohm [79] (formerly Renesas) | Shiga Factory | Japan | 200 | 150 | IGBT, MOSFET, MEMS | ||||
Rohm (Lapis Semiconductor)(formerly Oki Semiconductor)(Oki Electric Industry) [79] [80] | Miyasaki | Japan | 150 | MEMS | |||||
Rohm (Lapis Semiconductor) [79] | Building No.1 | Japan | 1961 [81] | Transistors | |||||
Rohm (Lapis Semiconductor) [79] | Building No.2 | Japan | 1962 [81] | Transistors | |||||
Rohm (Lapis Semiconductor) [79] | Building No.3 | Japan | 1962 [81] | Transistors | |||||
Rohm (Lapis Semiconductor) [79] | Building No.4 | Japan | 1969 [81] | Transistors | |||||
Rohm (Lapis Semiconductor) [79] | Chichibu Plant | Japan | 1975 [81] | DRAM | |||||
Rohm (Lapis Semiconductor) [79] | VLSI Laboratory No. 1 | Japan | 1977 [81] | VLSI | |||||
Rohm (Lapis Semiconductor) [79] | VLSI Laboratory No. 2 | Japan | 1983 [81] | ||||||
Rohm (Lapis Semiconductor) [79] | VLSI Laboratory No. 3 | Japan | 1983 [81] | DRAM | |||||
Rohm (Lapis Semiconductor) [79] | Thailand | 1992 [81] | |||||||
Rohm (Lapis Semiconductor) [79] | ULSI Laboratory No. 1 | Japan | 1992 [81] | 500 | DRAM | ||||
Rohm (Kionix) [82] | Ithaca | United States, New York, Ithaca | 150 | MEMS | |||||
Rohm (Kionix) [82] (formerly Renesas Kyoto) | Kyoto | Japan, Kyoto | 200 | MEMS | |||||
Fuji Electric [83] | Omachi | Japan, Nagano Prefecture | |||||||
Fuji Electric [84] | Iyama | Japan, Nagano Prefecture | |||||||
Fuji Electric [85] | Hokuriku | Japan, Toyama prefecture | |||||||
Fuji Electric [86] | Matsumoto [87] | Japan, Nagano prefecture | 100, 150 | 2000–1000 | 20,000 | CMOS. BiCMOS, bipolar, ASICs, discrete | |||
Fujitsu | Kawasaki | Japan, Kawasaki | 1966 [88] | ||||||
Fujitsu | Kumagaya Plant [89] | Japan, Saitama, 1224 Oaza-Nakanara, Kumagaya-shi, 360-0801 | 1974 | ||||||
Fujitsu [90] | Suzaka Plant | Japan, Nagano, 460 Oaza-Koyama, Suzaka-shi, 382-8501 | |||||||
Denso (formerly Fujitsu) | Iwate Plant [91] [4] [87] | Japan, Iwate, 4-2 Nishinemoriyama, Kanegasaki-cho, Isawa-gun, 029-4593 | 125, 150, 200 | 1500–350 | 100,000 | CMOS, MOS, bipolar | |||
Denso [92] | Denso Iwate [93] [94] [95] | Japan, Iwate Prefecture, Kanegasaki-cho | 0.088 | Under construction, 2019, May (planned) | Semiconductor wafers and sensors (since June 2017) | ||||
Canon Inc. | Oita [96] | Japan | |||||||
Canon Inc. | Kanagawa [97] | Japan | |||||||
Canon Inc. | Ayase [96] | Japan | |||||||
Sharp Corporation | Fukuyama [98] [87] | Japan | 125, 150, 200 | 1000, 800, 600 | 85,000 | CMOS | |||
Japan Semiconductor | Iwate | Japan | |||||||
Japan Semiconductor [99] | Oita | Japan | |||||||
Japan Advanced Semiconductor Manufacturing, Inc [100] | Kumamoto | Japan | 20+ | 2024 | 12 | 40, 22/28, 12/16 and 6/7 | 100,000+ | ||
Kioxia | Yokkaichi Operations [101] [102] | Japan, Yokkaichi | 1992 | 173,334 [103] [104] [105] [106] | Flash Memory | ||||
Kioxia/SanDisk | Y5 Phase 1 (at Yokkaichi Operations) | Japan, 800 Yamanoisshikicho, Yokkaichi, Mie [107] | 2011 | Flash | |||||
Kioxia/SanDisk | Y5 Phase 2 [107] (at Yokkaichi Operations) | Japan, Mie | 2011 | 300 | 15 [108] | Flash | |||
Kioxia [109] | Y3 (at Yokkaichi Operations) | Japan, Yokkaichi | 300 | NAND Memory | |||||
Kioxia [110] | Y4 (at Yokkaichi Operations) | Japan, Yokkaichi | 2007 | 300 | NAND Memory | ||||
Kioxia [111] | Kaga Toshiba | Japan, Ishikawa | Power semiconductor devices | ||||||
Kioxia [112] | Oita Operations | Japan, Kyushu | |||||||
Kioxia [113] [114] | Y6 (phase 1) (at Yokkaichi Operations) [115] | Japan, Yokkaichi | 1.6, 1.7, 1.8 (estimates) (combined costs of installation of equipment at Phase 1 and construction of Phase 2) [116] [102] | 2018 | 300 | BiCS FLASH™ | |||
Kioxia [113] [114] | Y6 (phase 2) (at Yokkaichi Operations) | Japan, Yokkaichi | 1.6, 1.7, 1.8 (estimates) (combined costs of installation of equipment at Phase 1 and construction of Phase 2) [116] [102] | Planned | 300 | BiCS FLASH™ | |||
Kioxia [113] [114] | Y7 | Japan, Yokkaichi | 4.6 [117] [118] | Planned | 300 | BiCS FLASH™ | |||
Kioxia [113] | Y2 (at Yokkaichi Operations) | Japan, Yokkaichi | 1995 | 3D NAND | |||||
Kioxia [119] [120] | New Y2 (at Yokkaichi Operations) | Japan, Yokkaichi | 2016, July 15 | 300 | 3D NAND | ||||
Kioxia [121] [122] [123] [124] | K1 | Japan, Iwate Prefecture | Under construction | 300 | 3D NAND | ||||
MinebeaMitsumi [125] | Rinkai Factory | Japan, 5-2-2, Omikacho, Hitachi-shi, Ibaraki, 319–1221 | MEMS Foundry | ||||||
MinebeaMitsumi [125] | Haramachi Factory | Japan, 20 Aza Oohara, Shimo-Ota, Haramachi-ku, Minamisouma-shi, Fukushima, 975-0041 | Power semiconductors | ||||||
MinebeaMitsumi [125] | Yamanashi Factory | Japan, 545, Itchohata, Chuo-shi, Yamanashi, 409-3813 | Power semiconductors | ||||||
Hitachi Energy (Formerly ABB) [126] | Lenzburg | Switzerland, Aargau, Lenzburg | 0.140 | 2010 (second phase) | 130, 150 | 18,750 (225,000 per year) | High power semiconductors, diodes, IGBT, BiMOS | ||
Hitachi Energy (formerly ABB, formerly Polovodiče a.s.) [126] [127] | Czech Republic, Prague | High power semiconductors, diodes [128] | |||||||
Mitsubishi Electric [129] | Power Device Works, Kunamoto Site [87] | Japan | 100, 125, 150, 200 | 2000–400 | 122,000 | Power semiconductors | |||
Mitsubishi Electric [129] | Power Device Works, Fukuoka Site [87] | Japan, Kunamoto Prefecture, Fukuoka City [130] | 100, 150 | 3000–2000 | 50,000 | Power semiconductors and sensors [130] | |||
Mitsubishi Electric [131] | High frequency optical device manufacturing plant [87] | Japan, Hyogo Prefecture [131] | 100, 125 | 30,000 | High frequency semiconductor devices (GaAsFET, GaN, MMIC) [131] | ||||
Powerchip Semiconductor | Memory Foundry, Fab P1 [132] [133] | Taiwan, Hsinchu | 2.24 [1] | 2002 [1] | 300 | 90, 70, 22 [134] | 80,000 | Foundry, Memory IC, LCD drive IC, Integrated Memory Chips, CMOS Image Sensors, and Power Management IC | |
Powerchip Semiconductor | Fab P2 [133] | Taiwan, Hsinchu, Hsinchu Science Park | 1.86 [1] | 2005 [1] | 300 | 90, 70, 22 [134] | 80,000 | Foundry, Memory IC, LCD drive IC, Integrated Memory Chips, CMOS Image Sensors, and Power Management IC | |
Powerchip Semiconductor (formerly Macronix) | Fab P3 [133] | Taiwan, Hsinchu, Hsinchu Science Park | 300 | 90, 70, 22 [134] | 20,000 | Foundry, Memory IC, LCD drive IC, Integrated Memory Chips, CMOS Image Sensors, and Power Management IC | |||
SPIL (formerly ProMOS) | ProMOS Fab 4 [135] [136] | Taiwan, Taichung | 1.6 | 300 | 70 | ||||
Macronix (formerly ProMOS) [137] | Fab 5 | Taiwan, Hsinchu [138] | 300 | 50,000 | |||||
Macronix [137] | Fab 2 | Taiwan | 200 | 48,000 | |||||
Hon Young Semiconductor (formerly Macronix [137] ) | Fab 1 [139] | 150 | 800-400 | 40,000 | Foundry, SiC, Automotive MOSFETs, MEMS | ||||
Renesas [140] | Naka Factory | Japan | 2009 | 300 | 28 [141] | ||||
Renesas (formerly Trecenti) | Japan [142] [143] | 300 | 180, 90, 65 | Foundry | |||||
Renesas [140] | Takasaki Factory | Japan, 111, Nishiyokotemachi, Takasaki-shi, Gunma, 370-0021 | |||||||
Renesas [140] | Shiga Factory | Japan, 2-9-1, Seiran, Otsu-shi, Shiga, 520-8555 | |||||||
Renesas [140] | Yamaguchi Factory | Japan, 20192–3, Higashimagura Jinga, Ube-shi, Yamaguchi, 757-0298 | |||||||
Renesas [140] | Kawashiri Factory | Japan, 1-1-1, Yahata, Minami-ku, Kumamoto-shi, Kumamoto, 861–4195 | |||||||
Renesas [140] | Saijo Factory | Japan, 8–6, Hiuchi, Saijo-shi, Ehime, 793-8501 | |||||||
Renesas [140] | Musashi Site | Japan, 5-20-1, Josuihon-cho, Kodaira-shi, Tokyo, 187-8588 | |||||||
Renesas – Intersil [140] | Palm Bay | United States, Florida, Palm Bay | |||||||
Bosch (formerly TSI Semiconductors [144] ) (formerly Renesas) | Roseville fab, M-Line, TD-Line, K-Line [145] [1] | United States, California, Roseville | 1992, 1985 [1] | 200 | |||||
TDK – Micronas | FREIBURG [146] [147] | Germany, 19 D-79108, Hans-Bunte-Strasse | |||||||
TDK (formerly Renesas) | Tsuruoka Higashi [148] [149] | 125 [150] | |||||||
TDK | Japan, Saku [151] | ||||||||
TDK – Tronics | United States, Texas, Addison [152] | ||||||||
Silanna (formerly Sapphicon Semiconductor) | Australia, New South Wales, Sydney [1] | 0.030 | 1965,1989 [1] | 150 | |||||
Silanna (formerly Sapphicon Semiconductor) (formerly Peregrine Semiconductor) (formerly Integrated Device Technology) | Australia, New South Wales, Sydney | 150 | 500, 250 | RF CMOS, SOS, foundry | |||||
Murata Manufacturing [154] | Nagano [150] | Japan | 0.100 | Murata en France (ex IPDIA): see https://www.ouest-france.fr/economie/industries/electronique-sous-banniere-japonaise-le-normand-ipdia-devient-geant-4646889 | SAW filters [150] | ||||
Murata Manufacturing [154] | Otsuki [150] | Japan | |||||||
Murata Manufacturing [154] | Kanazawa | Japan | 0.111 | SAW filters [150] | |||||
Murata Manufacturing (formerly Fujifilm) [155] [156] | Sendai | Japan, Miyagi Prefecture | 0.092 [150] | MEMS [157] | |||||
Murata Manufacturing [155] | Yamanashi | Japan, Yamanashi Prefecture | |||||||
Murata Manufacturing [158] | Yasu | Japan, Shiga Prefecture, Yasu | |||||||
Murata Electronics (Finland) [159] (formerly VTI, since 1979 Vaisalas int. semicon. line) [160] | Vantaa | Finland | 2012, [161] expanded 2019 [162] | 3D MEMS accelerometers, inclinometers, pressure sensors, gyros, oscillators etc. [163] | |||||
Mitsumi Electric [164] | Semiconductor Works #3 | Japan, Atsugi Operation Base | 2000 | ||||||
Mitsumi Electric [164] | Japan, Atsugi Operation Base | 1979 | |||||||
Sony [165] | Kagoshima Technology Center [87] | Japan, Kagoshima | 1973 | 100, 125, 150 | 2000–500 | 110,000 | Bipolar CCD, MOS, MMIC, SXRD | ||
Sony [165] | Oita Technology Center | Japan, Oita | 2016 | CMOS Image Sensor | |||||
Sony [165] | Nagasaki Technology Center [87] | Japan, Nagasaki | 1987 | 150 | 1000-350 | 80,000 | MOS LSI, CMOS Image Sensors, SXRD | ||
Sony [165] | Kumamoto Technology Center | Japan, Kumamoto | 2001 | CCD Image Sensors, H-LCD, SXRD | |||||
Sony [165] | Shiroishi Zao Technology Center | Japan, Shiroishi | 1969 | Semiconductor Lasers | |||||
Sony | Sony Shiroishi Semiconductor Inc. | Japan, Miyagi | Semiconductor Lasers [166] | ||||||
Sony (formerly Renesas) (formerly NEC Electronics) (formerly NEC) [165] [167] [168] | Yamagata Technology Center [87] | Japan, Yamagata | 2014 (Sony) | 100, 125, 150, 200 | 3000, 2000, 800 | MOS, bipolar, CMOS Image Sensor, eDRAM (formerly) | |||
SK Hynix [169] | China, Chongqing | ||||||||
SK Hynix [169] | China, Chongqing | ||||||||
SK Hynix [170] [171] | South Korea, Cheongju, Chungcheongbuk-do | Under construction [172] | NAND Flash | ||||||
SK Hynix [171] | South Korea, Cheongju | Under construction | NAND Flash | ||||||
SK Hynix | HC1 | China, Wuxi | 300 | 100,000 [18] | DRAM | ||||
SK Hynix | HC2 | China, Wuxi | 300 | 70,000 [18] | DRAM | ||||
SK Hynix [171] | M16 | South Korea, Icheon | 3.13 (13.4 total planned) | 2021 (planned) | 300 | 10 (EUV) | 15,000–20,000 (initial) | DRAM | |
LG Innotek [173] | Paju | South Korea, 570, Hyuam-ro, Munsan-eup, Paju-si, Gyeonggi-do, 10842 | LED Epi-wafer, Chip, Package | ||||||
ON Semiconductor (formerly GlobalFoundries)(formerly IBM) [174] [175] [176] | United States, New York, East Fishkill | 2.5, +.29 (future) [177] | 2002 | 300 | 90–22, 14 | 12,000–15,000 [177] | Foundry, RF SOI, SOI FinFET (former), SiGe, SiPh | ||
ON Semiconductor (formerly LSI) | Gresham [178] | United States, Oregon, Gresham | 200 | 110 | |||||
ON Semiconductor (formerly Fairchild Semiconductor) (formerly National Semiconductor) (formerly Fairchild Semiconductor) | United States, Pennsylvania, Mountain Top | 1960–1997 | 200 | 350 | |||||
ON Semiconductor (formerly TESLA) | Roznov | Czech Republic, Zlín, Rožnov pod Radhoštěm | 1956 | 150, 200 | 1000 | 80,000 | Si, SiC | ||
ON Semiconductor (formerly Motorola) | ISMF | Malaysia, Seremban | 150 | 350 | 80,000 | Discrete | |||
ON Semiconductor (formerly Fujitsu) [179] [180] | Aizu Wakamatsu Plant [181] [87] | Japan, Fukushima, 3 Kogyo Danchi, Monden-machi, Aizuwakamatsu-shi, 965-8502 | 1970 [88] | 150, 200 [182] [183] [184] [185] | 2000-130 | Memory, Logic | |||
JS Foundry K.K. (formerly ON Semiconductor)(formerly Sanyo) [186] [187] | Niigata [87] | Japan, Niigata | 125, 150 | 2000–600, 350 | 120,000 | CMOS, bipolar, BiCMOS | |||
BelGaN Group (formerly ON Semiconductor) (formerly AMI Semiconductor) (formerly Alcatel Microelectronics) (formerly Mietec) [188] | Oudenaarde [189] | Belgium, East Flanders, Oudenaarde | 150, 200 | 3000, 2000–350 | GaN, mixed-signal CMOS, BCD foundry | ||||
LA Semiconductor (formerly ON Semiconductor)(formerly AMI Semiconductor) | Pocatello [190] | United States, Idaho, Pocatello | 1997 [191] | 200 | 350 | ||||
Diodes Incorporated [192] (formerly ON Semiconductor) (formerly Fairchild Semiconductor) (formerly National Semiconductor) (formerly Fairchild Semiconductor) | SPFAB | United States, Maine, South Portland | 1960–1997 | 200 | 350 | ||||
Diodes Incorporated [193] (formerly Zetex Semiconductors) | OFAB | UK, England, Greater Manchester, Oldham | 150 | ||||||
Diodes Incorporated (formerly BCD Semi) [194] | China | 150 | 4000–1000 | ||||||
Lite-On Optoelectronics [195] | China, Tianjin | ||||||||
Lite-On Optoelectronics [195] | Thailand, Bangkok | ||||||||
Lite-On Optoelectronics [195] | China, Jiangsu | ||||||||
Lite-On Semiconductor [196] | Keelung Plant | Taiwan, Keelung | 1990 | 100 | Thyristor, DIscrete | ||||
Lite-On Semiconductor [196] | Hsinchu Plant | Taiwan, Hsinchu | 2005 | Bipolar BCD, CMOS | |||||
Lite-On Semiconductor [196] | Lite-On Semi (Wuxi) | China, Jiangsu | 2004 | 100 | Discrete | ||||
Lite-On Semiconductor [196] | Wuxi WMEC Plant | China, Jiangsu | 2005 | Discrete, Power, Optical ICs | |||||
Lite-On Semiconductor [196] | Shanghai (SSEC) Plant | China, Shanghai | 1993 | 76 | Fab, Assembly | ||||
Trumpf [197] (formerly Philips Photonics) | Germany, Baden-Württemberg, Ulm | VCSEL | |||||||
Philips [198] | Netherlands, North Brabant, Eindhoven | 150, 200 | 30,000 | R&D, MEMS | |||||
Newport Wafer Fab [199] (formerly Infineon Technologies) | FAB11 | UK, Wales, Newport | 200 [200] | 700-180 [200] | 32,000 [200] | Foundry, Compound Semiconductors, IC, MOSFET, IGBT [201] | |||
Nexperia (formerly NXP Semiconductors) (formerly Philips) | Hamburg site [202] | Germany, Hamburg | 1953 | 200 | 35,000 | Small-signal and bipolar discrete devices | |||
Nexperia (formerly NXP Semiconductors) (formerly Philips)(formerly Mullard) | Manchester [202] | UK, England, Greater Manchester, Stockport | 1987? | 150, 200 | 24,000 | GaN FETs, TrenchMOS MOSFETs | |||
NXP Semiconductors (formerly Philips) | ICN8 | Netherlands, Gelderland, Nijmegen | 200 | 40,000+ [203] | SiGe | ||||
NXP Semiconductors | Japan [204] | Bipolar, Mos, Analog, Digital, Transistors, Diodes | |||||||
NXP Semiconductors - SSMC | SSMC | Singapore | 1.7 [1] | 2001 [1] | 200 | 120 | 53,000 | SiGe | |
NXP Semiconductors – Jilin Semiconductor | China, Jilin | 130 | |||||||
NXP Semiconductors (formerly Freescale Semiconductor) (formerly Motorola) | Oak Hill Fab [205] | United States, Texas, Austin | 0.8 [206] | 1991 | 200 | 250 | |||
NXP Semiconductors (formerly Freescale Semiconductor) (formerly Motorola) | Chandler Fab [207] | United States, Arizona, Chandler [208] | 1.1 [209] +0.1 (GaN) | 1993 | 150 (GaN), 200 | 180 | GaN-on-SiC pHEMT | ||
NXP Semiconductors (formerly Freescale Semiconductor) (formerly Motorola) | ATMC [210] | United States, Texas, Austin | 1995 | 200 | 90 | ||||
NXP Semiconductors (formerly Freescale Semiconductor) (formerly Motorola) | MOTOFAB1 [211] | Mexico, Jalisco, Guadalajara | 2002 | ||||||
AWSC | Taiwan, Tainan [1] | 1999 [1] | 150 | 12,000 | Foundry, GaAs HBT, D pHEMT, IPD, ED pHEMT, ED BiHEMT, InGaP | ||||
Skyworks Solutions [212] (formerly Conexant)(formerly Rockwell) | United States, California, Newbury Park | 100, 150 | Compound Semiconductors (GaAs, AlGaAs, InGaP) | ||||||
Skyworks Solutions [212] (formerly Alpha Industries) | United States, Massachusetts, Woburn | 100, 150 | RF/cellular components (SiGe, GaAs) | ||||||
Skyworks Solutions [212] | Japan, Osaka | SAW, TC-SAW Filters | |||||||
Skyworks Solutions [212] | Japan, Kadoma | SAW, TC-SAW Filters | |||||||
Skyworks Solutions [212] | Singapore, Bedok South Road | SAW, TC-SAW Filters | |||||||
Win Semiconductor | Fab A [213] | Taiwan, Taoyuan City | 150 [214] | 2000–10 | Foundry, GaAs | ||||
Win Semiconductor | Fab B [213] | Taiwan, Taoyuan City | 150 [214] | 2000–10 | Foundry, GaAs, GaN | ||||
Win Semiconductor | Fab C | Taiwan, Taoyuan [1] | 0.050, 0.178 | 2000, 2009 [1] | 150 | Foundry, GaAs | |||
ams [215] | FAB B | Austria, Styria, Unterpremstätten | 200 | 350 | |||||
Osram (Osram Opto Semiconductors) | Malaysia, Kulim, Kulim Hi-Tech Park | 0.350, 1.18 [216] | 2017, 2020 (second phase, planned) [217] [218] | 150 | LEDs | ||||
Osram (Osram Opto Semiconductors) | Malaysia, Penang [219] [220] | 2009 | 100 | LEDs | |||||
Osram (Osram Opto Semiconductors) | Germany, Bavaria, Regensburg [221] | 2003, 2005 (second phase) [222] | LEDs | ||||||
Winbond | Memory Product Foundry [223] | Taiwan, Taichung | 300 | 46 | |||||
Winbond | CTSP Site [224] [225] | Taiwan, No. 8, Keya 1st Rd., Daya Dist., Central Taiwan Science Park, Taichung City 42881 | 300 | ||||||
Winbond [226] | Planned | 300 | |||||||
Vanguard International Semiconductor | Fab 1 [139] | Taiwan, Hsinchu | 0.997 [1] | 1994 [1] | 200 | 500, 350, 250 | 55,000 | Foundry, CMOS | |
Vanguard International Semiconductor (formerly Winbond) | Fab 2 (formerly Fab 4&5) [227] | Taiwan, Hsinchu | 0.965 [1] | 1998 [1] | 200 | 55,000 | Foundry | ||
Vanguard International Semiconductor Corporation (formerly GlobalFoundries) (formerly Chartered) | Fab 3E [228] | Singapore | 1.3 [1] | 200 | 180 | 34,000 | Foundry | ||
TSMC | Fab 2 [229] [139] | Taiwan, Hsinchu | 0.735 [1] | 1990 [1] | 150 | 800, 600, 500 | 88,000 [230] [1] | Foundry, CMOS | |
TSMC | Fab 3 [139] | Taiwan, Hsinchu | 2 [1] | 1995 [1] | 200 | 500, 350, 250 | 100,000 [1] | Foundry, CMOS | |
TSMC | Fab 5 [139] | Taiwan, Hsinchu | 1.4 [1] | 1997 [1] | 200 | 350, 250, 180 | 48,000 [1] | Foundry, CMOS | |
TSMC | Fab 6 | Taiwan, Tainan | 2.1 [1] | 2000, January; 2001 [142] | 200, 300 | 180–? | 99,000 [1] | Foundry | |
TSMC (formerly TASMC) (formerly Acer Semiconductor Manufacturing Inc.) (formerly Texas Instruments) [231] [232] [233] | Fab 7 [234] | Taiwan | 200 | 350, 250, 220, 180 | 33,000 | Foundry (current) DRAM (former), Logic (former) | |||
TSMC (formerly WSMC) | Fab 8 [235] | Taiwan, Hsinchu | 1.6 [1] | 1998 [1] | 200 | 250, 180 | 85,000 [1] | Foundry | |
TSMC (formerly WSMC) [143] | 2000 | 200 | 250, 150 | 30,000 | Foundry | ||||
TSMC China Company | Fab 10 | China, Shanghai | 1.3 [1] | 2004 [1] | 200 | 74,000 | Foundry | ||
TSMC | Fab 12 | Taiwan, Hsinchu | 5.2, 21.6 (total, all phases combined) [1] | 2001 [1] | 300 | 150–28 | 77,500–123,800 (all phases combined) [1] | Foundry | |
TSMC | Fab 12 (P4) | Taiwan, Hsinchu | 6 [1] | 2009 [1] | 300 | 20 | 40,000 [1] | Foundry | |
TSMC | Fab 12 (P5) | Taiwan, Hsinchu | 3.6 [1] | 2011 [1] | 300 | 20 | 6,800 [1] | Foundry | |
TSMC | Fab 12 (P6) | Taiwan, Hsinchu | 4.2 [1] | 2013 [1] | 300 | 16 | 25,000 | Foundry | |
TSMC | Fab 14 | Taiwan, Tainan | 5.1 [1] | 2002, [142] 2004 [1] | 300 | 20 | 82,500 [1] | Foundry | |
TSMC | Fab 14 (B) | Taiwan, Tainan | 300 | 16 | 50,000+ [236] | Foundry | |||
TSMC | Fab 14 (P3) [1] | Taiwan, Tainan | 3.1 [1] | 2008 [1] | 300 | 16 | 55,000 [1] | Foundry | |
TSMC | Fab 14 (P4) [1] | Taiwan, Tainan | 3.750 [1] | 2011 [1] | 300 | 16 | 45,500 [1] | Foundry | |
TSMC | Fab 14 (P5) [1] | Taiwan, Tainan | 3.650 [1] | 2013 [1] | 300 | 16 | Foundry | ||
TSMC | Fab 14 (P6) [1] | Taiwan, Tainan | 4.2 [1] | 2014 [1] | 300 | 16 | Foundry | ||
TSMC | Fab 14 (P7) [1] | Taiwan, Tainan | 4.850 [1] | 2015 [1] | 300 | 16 | Foundry | ||
TSMC | Fab 15 [237] | Taiwan, Taichung | 9.3 | 2011 | 300 | 20 | 100,000+(166,000 estimate) [238] [236] [239] | Foundry | |
TSMC | Fab 15 (P1) [1] | Taiwan, Taichung | 3.125 [1] | 2011 | 300 | 4,000 [1] | Foundry | ||
TSMC | Fab 15 (P2) [1] | Taiwan, Taichung | 3.150 [1] | 2012 [1] | 300 | Foundry | |||
TSMC | Fab 15 (P3) [1] | Taiwan, Taichung | 3.750 [1] | 2013 [1] | 300 | Foundry | |||
TSMC | Fab 15 (P4) [1] | Taiwan, Taichung | 3.800 [1] | 2014 [1] | 300 | Foundry | |||
TSMC | Fab 15 (P5) [1] | Taiwan, Taichung | 9.020 [1] | 2016 [1] | 300 | 35,000 | Foundry | ||
TSMC | Fab 18 (P1-P3) | Taiwan, Southern Taiwan Science Park [240] [241] | 17.08 | 2020 (P7 under construction) | 300 | 5 [242] | 120,000 | Foundry | |
TSMC | Fab 18 (P4-P6) | Taiwan, Southern Taiwan Science Park | 2022 (planned), under construction | 300 | 3 [18] [243] [244] | 120,000 | Foundry | ||
TSMC | Fab 21 | United States, Arizona, Phoenix | 12 [245] | Q1 2024 (planned), P1 under construction [245] [246] | 300 | 5 & 4 [246] | 20,000 [246] | Foundry | |
Epistar | Fab F1 [247] | Taiwan, Longtan Science Park | LEDs | ||||||
Epistar | Fab A1 [247] | Taiwan, Hsinchu Science Park | LEDs | ||||||
Epistar | Fab N2 [247] | Taiwan, Hsinchu Science Park | LEDs | ||||||
Epistar | Fab N8 [247] | Taiwan, Hsinchu Science Park | LEDs | ||||||
Epistar | Fab N1 [247] | Taiwan, Hsinchu Science Park | LEDs | ||||||
Epistar | Fab N3 [247] | Taiwan, Hsinchu Science Park | LEDs | ||||||
Epistar | Fab N6 [247] | Taiwan, Chunan Science Park | LEDs | ||||||
Epistar | Fab N9 [247] | Taiwan, Chunan Science Park | LEDs | ||||||
Epistar | Fab H1 [247] | Taiwan, Central Taiwan Science Park | LEDs | ||||||
Epistar | Fab S1 [247] | Taiwan, Tainan Science Park | LEDs | ||||||
Epistar | Fab S3 [247] | Taiwan, Tainan Science Park | LEDs | ||||||
Epistar (formerly TSMC) [248] [249] [250] | Taiwan, Hsin-Chu Science Park | 0.080 | 2011, second half | LEDs | |||||
Lextar Archived 2017-11-07 at the Wayback Machine | T01 | Taiwan, Hsinchu Science Park | LEDs | ||||||
GCS | United States, California, Torrance [1] | 1999 [1] | 100 | 6,400 | Foundry, GaAs, InGaAs, InGaP, InP, HBT, PICs | ||||
Bosch | Germany, Baden-Württemberg, Reutlingen | 1995 [251] | 150 | ASIC, analog, power, SiC | |||||
Bosch | Germany, Saxony, Dresden | 1.0 [252] | 2021 | 300 | 65 | ||||
Bosch | WaferFab | Germany, Baden-Württemberg, Reutlingen | 0.708 [253] | 2010 [251] | 200 | 30,000 | ASIC, analog, power, MEMS | ||
STMicroelectronics | AMK8 (second, newer fab) | Singapore, Ang Mo Kio | 1995 | 200 | |||||
STMicroelectronics (formerly SGS Microelettronica) | AMJ9 (first fab) | Singapore, Ang Mo Kio | 1984 [254] | 150, 200 | 6" 14 kpcs/day, 8" 1.4 kpcs/day | Power-MOS/ IGBT/ bipolar/ CMOS | |||
X-Fab | Erfurt | Germany, Thuringia, Erfurt | 1985 [1] | 200 [255] | 1000-600 [255] | 11200– [255] | Foundry | ||
X-Fab (formerly ZMD) | Dresden | Germany, Saxony, Dresden | 0.095 [1] | 1985 [1] | 200 [256] | 1000-350 [256] | 6000– [256] | Foundry, CMOS, GaN-on-Si | |
X-Fab (formerly Itzehoe) | Itzehoe | Germany, Schleswig-Holstein, Itzehoe | 200 [257] | 13000– [257] | Foundry, MEMS | ||||
X-Fab (formerly 1st Silicon) [258] [259] | Kuching | Malaysia, Kuching | 1.89 [1] | 2000 [1] | 200 [260] | 350-130 [260] | 30,000– [260] | Foundry | |
X-Fab (formerly Texas Instruments) | Lubbock | United States, Texas, Lubbock | 0.197 [1] | 1977 [1] | 150, 200 [261] | 1000-600 [261] | 15000– [261] | Foundry, SiC | |
X-Fab France SAS (formerly Altis Semiconductor) (formerly IBM) [262] | ACL-AMF | France, Île-de-France, Corbeil-Essonnes | 1991, 1964 [1] | 200 | 350-130 | Foundry, CMOS, RF SOI | |||
IXYS | Germany, Hesse, Lampertheim [263] | IGBT [263] | |||||||
IXYS | UK, England, Wiltshire, Chippenham [263] | ||||||||
IXYS | United States, Massachusetts [263] | ||||||||
IXYS | United States, California [263] | ||||||||
Samsung | V1-Line [264] | South Korea, Hwaseong | 6 | 2020, February 20 | 300 | 7 | Foundry | ||
Samsung | S5-Line | South Korea, Pyeongtaek | 300 | Foundry | |||||
Samsung | S4-Line | South Korea, Hwaseong | 300 | Foundry | |||||
Samsung | S3-Line | South Korea, Hwaseong | 10.2, 16.2 (planned) [265] [266] | 2017 [265] | 300 | 10 | 200,000 | Foundry | |
Samsung | S1-Line | South Korea, Giheung | 33 (total) | 2005 (second phase), 1983 (first phase) [267] [268] | 300 | 65–7 | 62,000 | Foundry, CMOS, FDSOI | |
Samsung | Line-6 | South Korea, Giheung | 100, 150, 200 | 1500–500, 180–65 | Foundry, CMOS, BiCMOS | ||||
Samsung | S6-Line | United States, Texas, Taylor | 300 | Foundry | |||||
Samsung | S2-Line | United States, Texas, Austin | 16 [269] [270] | 2011 | 300 | 65–11 | 92,000 | Foundry, CMOS, FDSOI | |
Samsung | Pyeongtaek [271] [272] [265] | South Korea, Pyeongtaek | 14.7, 27 (total) [273] [270] [274] [275] [276] [277] [278] [172] | 2017, July 6 | 300 | 14 | 450,000 [279] | V-NAND, DRAM | |
Samsung | Samsung China Semiconductor [280] | China, Shaanxi Province | DDR Memory | ||||||
Samsung | Samsung Suzhou Research Center (SSCR) [281] | China, Suzhou, Suzhou Industrial Park | DDR Memory | ||||||
Samsung | Onyang Complex [280] | South Korea, Chungcheongnam-do | display.backend process.test | ||||||
Samsung | F1x1 [282] [265] | China, Xian | 2.3 [283] | 2014 (first phase, second phase is under review) [265] | 300 | 20 | 100,000 | VNAND | |
Samsung | Giheung Campus [284] | South Korea, Gyeonggi-do, Yongin | LEDs | ||||||
Samsung | Hwasung Campus [284] | South Korea, Gyeonggi-do, Hwaseong | LEDs | ||||||
Samsung | Tianjin Samsung LED Co., Ltd. [284] | China, Tianjin, Xiqing | LEDs | ||||||
Seagate | United States, Minnesota, Minneapolis [285] | ||||||||
Seagate | UK, Northern Ireland [286] [287] [288] [289] | ||||||||
Broadcom Inc. (formerly Avago) | United States, Colorado, Fort Collins [290] | ||||||||
Wolfspeed (formerly Cree Inc.) [291] | Durham | United States, North Carolina, Durham | Compound Semiconductors, LEDs | ||||||
Wolfspeed (formerly Cree Inc.) [292] | Research Triangle Park | United States, North Carolina | GaN HEMT RF ICs | ||||||
SMART Modular Technologies | Brazil, São Paulo, Atibaia | 2006 | Packaging | ||||||
Infineon Technologies | Villach | Austria, Carinthia, Villach | 1970 [293] | 100, 150, 200, 300 | MEMS, SiC, GaN | ||||
Infineon Technologies | Dresden | Germany, Saxony, Dresden | 3 [294] | 1994–2011 [295] | 200, 300 | 90 | |||
Infineon Technologies | Kulim [296] | Malaysia, Kulim | 2006 [297] | 200, 300 | 50,000 | ||||
Infineon Technologies | Kulim 2 | Malaysia, Kulim | 2015 | 200, 300 | 50,000 | ||||
Infineon Technologies | Regensburg [298] | Germany, Bavaria, Regensburg | 1959 | ||||||
Infineon Technologies | Cegled [299] | Hungary, Pest, Cegléd | |||||||
Infineon Technologies | El Segundo | United States, California, El Segundo [300] | |||||||
D-Wave Systems [301] | Superconducting Foundry [302] | Quantum Processing Units (QPUs) [302] | |||||||
GlobalFoundries (formerly AMD) | Fab 1 Module 1 [303] | Germany, Saxony, Dresden | 3.6 [1] | 2005 | 300 | 45-22 | 35,000 [1] | Foundry, SOI, FDSOI | |
GlobalFoundries (formerly AMD) | Fab 1 Module 2 | Germany, Saxony, Dresden | 4.9 [1] | 1999 | 300 | 45-22 | 25,000 [1] | Foundry, SOI | |
GlobalFoundries | Fab 1 Module 3 | Germany, Saxony, Dresden | 2.3 [1] | 2011 [1] | 300 | 45-22 | 6,000 [1] | Foundry, SOI | |
GlobalFoundries (formerly Chartered) | Fab 2 [228] | Singapore | 1.3 [1] | 1995 [1] | 200 | 600-350 | 56,000 [1] | Foundry, SOI | |
GlobalFoundries (formerly Chartered) | Fab 3/5 [228] | Singapore | 0.915, 1.2 [1] | 1997, 1995 [1] | 200 | 350-180 | 54,000 | Foundry, SOI | |
GlobalFoundries (formerly Chartered) | Fab 6 [228] (merged into Fab 7) | Singapore | 1.4 [1] | 2000 [1] | 200, 300 (merged) | 180-110 | 45,000 | Foundry, SOI | |
GlobalFoundries (formerly Chartered) | Fab 7 [303] | Singapore | 4.6 [1] | 2005 [1] | 300 | 130, 110, 90, 65, 40 | 50,000 | Foundry, Bulk CMOS, RF SOI | |
GlobalFoundries | Fab 8 [303] | United States, New York, Malta | 4.6, 2.1, (1, future) [304] 13+ (total) [177] [305] | 2012, 2014 [1] | 300 | 28, 22, 14, 12 | 60,000 (+12,500 future) | Foundry, High-K Metal Gate, [306] SOI FinFET | |
GlobalFoundries (formerly IBM [307] ) | Fab 9 | United States, Vermont, Essex Junction | 1957 [308] | 200 | 350-90 | 50,000 [309] | Foundry, SiGe, RF SOI, GaN [309] | ||
GlobalFoundries | Technology Development Center [1] | United States, New York, Malta | 1.5 [1] | 2014 [1] | |||||
SUNY Poly CNSE | NanoFab 300 North [310] | United States, New York, Albany | 0.175, 0.050 | 2004, 2005 | 300 | 65, 45, 32, 22 | |||
SUNY Poly CNSE | NanoFab 200 [311] | United States, New York, Albany | 0.016 | 1997 | 200 | ||||
SUNY Poly CNSE | NanoFab Central [310] | United States, New York, Albany | 0.150 | 2009 | 300 | 22 | |||
Skorpios Technologies (formerly Novati)(formerly ATDF)(formerly SEMATECH) | United States, Texas, Austin [1] [312] | 0.065 | 1989 [1] | 200 | 10,000 | MEMS, photonics, foundry | |||
Opto Diode | United States, California, Camarillo [313] | ||||||||
Optek Technology [204] | 1968 | 100, 150 | GaAs, LEDs | ||||||
II-VI (formerly Oclaro)(formerly Bookham) (formerly NORTHERN TELECOM SEMICONDUCTOR NORTHERN TELECOM EUROPE [204] ) (formerly JDS Uniphase)(formerly Uniphase) | Semiconductor Lasers, Photodiodes | ||||||||
Infinera | United States, California, Sunnyvale [314] [315] | ||||||||
Rogue Valley Microdevices [316] [317] [318] | United States, Oregon, Medford | 2003 | 50.8–300 | MEMS Foundry, Thin Films Foundry, Silicon Wafers, Wafer Services, MEMS R&D | |||||
Atomica | Fab 1 | United States, California, Goleta | 2000 | 150, 200 | 350 | 20,000 | Foundry: MEMS, Photonics, Sensors, Biochips | ||
Sensera | uDev-1 | United States, Massachusetts, Woburn | 2014 | 150 | 700 | 1,000 | MEMS, MicroDevice assembly | ||
Rigetti Computing | Fab-1 [319] [320] [321] | United States, California, Fremont | 130 | Quantum Processors | |||||
NHanced Semiconductors [322] | MNC | United States, North Carolina, Morrisville | 2001 | 100, 150, 200 | >=500 | 1000 | MEMS, Silicon Sensors, BEoL, 2.5/3D and advanced packaging | ||
Polar Semiconductor [323] | FAB 1,2,3 | United States, Minnesota, Bloomington | 200 | BCD, HV, GMR | |||||
Orbit Semiconductor [204] | 100 | CCD, CMOS | |||||||
Entrepix | United States, Arizona, Tempe [1] | 2003 [1] | |||||||
Medtronic | United States, Arizona, Tempe [1] | 1973 [1] | |||||||
Technologies and Devices International | United States, Florida, Silver Springs [1] | 2002 [1] | |||||||
Soraa Inc | United States, California [324] [325] | ||||||||
Soraa Laser Diode [324] | |||||||||
Mirrorcle Technologies | United States, California, Richmond [326] | ||||||||
HTE LABS | HTE LABS | United States, California, San Jose | 0.005 | 2009 | 100, 150 | 4000–1000 | 1,000 | Pure Play Wafer Foundry -BIPOLAR, BICMOS, CMOS, MEMS www.htelabs.com | |
HT Micron | Brazil, Rio Grande do Sul, São Leopoldo | 2014 | DRAM, eMCP, iMCP | ||||||
Unitec do Brasil | Brazil, Minas Gerais, Ribeirão das Neves | Planned | |||||||
Unitec Blue [327] | Argentina, Buenos Aires Province, Chascomús | 0.3 (1.2 planned) [328] | 2013 | RFID, SIM, EMV | |||||
Everlight | Yuan-Li Plant | Taiwan, Miao-Li | LEDs | ||||||
Everlight | Pan-Yu Plant | China | LEDs | ||||||
Everlight | Tu-Cheng Plant | Taiwan, Taipei Country | LEDs | ||||||
Optotech [329] | Taiwan, Hsinchu | LEDs | |||||||
Arima Optoelectronics | Taiwan, Hsinchu [1] | 1999 [1] | |||||||
Episil Semiconductor | Taiwan, Hsinchu [1] | 1992, 1990, 1988 [1] | |||||||
Episil Semiconductor | Taiwan, Hsinchu [1] | 1992, 1990, 1988 [1] | |||||||
Creative Sensor Inc. Archived 2017-07-07 at the Wayback Machine [330] [331] | NanChang Creative Sensor | China, Jiangxi | 2007 | Image Sensors | |||||
Creative Sensor Inc. Archived 2017-07-07 at the Wayback Machine Archived 2017-07-07 at the Wayback Machine [330] | Wuxi Creative Sensor | China, JiangSu | 2002 | ||||||
Creative Sensor Inc. Archived 2017-07-07 at the Wayback Machine Archived 2017-07-07 at the Wayback Machine [330] | Wuxi Creative Sensor | Taiwan, Taipei City | 1998 | ||||||
Visera Technologies [332] | Headquarters Phase I | Taiwan, Hsinchu Science-based Industrial Park | 2007, September | CMOS Image Sensors | |||||
Panjit | Taiwan, Kaohsiung [1] | 0.1 | 2003 [1] | ||||||
Nanosystem Fabrication Facility | Hong Kong [333] | ||||||||
GTA Semiconductor (formerly ASMC) [334] [335] | Fab 2, Fab 3 [336] | China, Shanghai, Xuhui District | 200 | 350, 180, 150 [337] | 55333 | HV Analog, Power | |||
GTA Semiconductor | Fab 5, Fab 6 | China, Shanghai, Pudong New Area | 5.1 [338] | 2020 | 150, 200, 300 | 115000 | |||
Shanghai Belling [339] | China, Shanghai | 150 | 1200 | BiCMOS, CMOS | |||||
SiSemi [340] | China, Shenzhen, Longgang High-tech Industrial Park [341] | 2004 | 130 | Power semiconductors, LED drivers, bipolar power transistors, power MOSFETs | |||||
SiSemi [341] | 1997 | 100 | Transistors | ||||||
CRMicro (formerly CSMC) [342] | Fab 1 | 1998 [1] | 150 [343] | 60,000 [1] | HV Analog, MEMS, Power, Analog, Foundry | ||||
CRMicro (formerly CSMC) | Fab 2 | China, Wuxi | 2008 [1] | 200 [343] | 180, 130 | 40,000 [1] | HV Analog, Foundry | ||
CRMicro (formerly CSMC) | Fab 3 | 1995 [1] | 200 [343] | 130 | 20,000 [1] | ||||
CRMicro (formerly CSMC) | Fab 5 | 2005 [1] | 30,000 [1] | ||||||
Nexchip [18] | N1 [344] | China, Hefei | Q4 2017 | 300 | 40,000 | Display Drivers IC [345] | |||
Nexchip [18] | N2 [344] | China, Hefei | Under construction | 300 | 40,000 | ||||
Nexchip [18] | N3 [344] | China, Hefei | Under construction | 300 | 40,000 | ||||
Nexchip [18] | N4 [344] | China, Hefei | Under construction | 300 | 40,000 | ||||
Wandai [18] | CQ | China, Chongqing | Under construction | 300 | 20,000 | ||||
San'an Optoelectronics [346] | Tianjin San'an Optoelectronics Co., Ltd. | China, Tianjin | LEDs | ||||||
San'an Optoelectronics | Xiamen San'an Optoelectronics Technology Co., Ltd. | China, Xiamen | LEDs | ||||||
San'an Optoelectronics | Xiamen San'an Optoelectronics Co., Ltd. | China, Xiamen | LEDs | ||||||
San'an Optoelectronics | Wuhu Anrui Optoelectronics Co., Ltd. | China, Wuhu | LEDs | ||||||
San'an Optoelectronics | Anrui San'an Optoelectronics Co., Ltd. | China, Wuhu | LEDs | ||||||
San'an Optoelectronics | Luminus Summary | United States | LEDs | ||||||
San'an Optoelectronics | Quanzhou San'an Semiconductor Technology Co., Ltd. | China, Nan'an | LEDs | ||||||
Sanan IC [347] | Xiamen Fab [348] | China, Xiamen | 0.00785 | 2014 | 150 | 30,000 | SAW filters, Foundry, GaA, GaN, RF, Power | ||
Sanan IC | Quanzhou Fab | China, Quanzhou | 4.6 | 2017 | 150 | 8,000 | SAW filters, Foundry, GaA, RF | ||
Sanan IC | Changsha Fab | China, Changsha | 2.3 | 2021 | 150 | 30,000 | Foundry, GaN, SiC, Power | ||
Hua Hong Semiconductor | HH Fab7 | China, Wuxi | 300 | 90-55 | 95,000 [349] | Foundry, eNVM, RF, Mixed Signal, Logic, Power Management, Power Discrete | |||
Hua Hong Semiconductor | HH Fab1 | China, Shanghai, Jinqiao | 200 | 95 | 65,000 [350] | Foundry, eNVM, RF, Mixed Signal, Logic, Power Management, Power Discrete | |||
Hua Hong Semiconductor | HH Fab2 | China, Shanghai, Zhangjiang | 200 | 180 | 60,000 [350] | Foundry, eNVM, RF, Mixed Signal, Logic, Power Management, Power Discrete | |||
Hua Hong Semiconductor | HH Fab3 | China, Shanghai, Zhangjiang | 200 | 90 | 53,000 [350] | Foundry, eNVM, RF, Mixed Signal, Logic, Power Management, Power Discrete | |||
Hua Hong Semiconductor (HLMC) | HH Fab5 [351] | China, Shanghai, Zhangjiang | 2011 | 300 | 65/55-40 | 35,000 | Foundry | ||
Hua Hong Semiconductor (HLMC) | HH Fab6 | China, Shanghai, Kangqiao | 2018 | 300 | 28/22 | 40,000 | Foundry | ||
HuaLei Optoelectronic | China | LEDs [352] | |||||||
Sino King Technology [17] | China, Hefei | 2017 | DRAM | ||||||
APT Electronics | China, Guangzhou [1] | 2006 [1] | |||||||
Aqualite | China, Guangzhou [1] | 2006 [1] | |||||||
Aqualite | China, Wuhan [1] | 2008 [1] | |||||||
Xiamen Jaysun Semiconductor Manufacturing | Fab 101 | China, Xiamen [1] | 0.035 | 2011 [1] | |||||
Xiyue Electronics Technology | Fab 1 | China, Xian [1] | 0.096 | 2007 [1] | |||||
Hanking Electronics | Fab 1 | China, Fushun | 2018 | 200 | 10,000 – 30,000 | MEMS Foundry Archived 2021-03-08 at the Wayback Machine , MEMS Design Archived 2021-03-08 at the Wayback Machine MEMS Sensors (Inertial, Pressure, Ultrasound, IoT Motion Sensors | |||
CanSemi [353] | Phase I | China, Guangzhou | 4 | 2019 [354] | 300 | 180–90 [355] | 20,000 | Power, Analog, Power Discrete | |
CanSemi | Phase II | China, Guangzhou | 2022 | 300 | 90-55 | 20,000 | |||
CanSemi | Phase III | China, Guangzhou | 2.4 [356] | Planned | 300 | 55-40 | 40,000 | Automotive, IoT | |
SensFab | Singapore [1] | 1995 [1] | |||||||
MIMOS Semiconductor | Malaysia, Kuala Lumpur [1] | 0.006, 0.135 | 1997, 2002 [1] | ||||||
Silterra Malaysia | Fab1 | Malaysia, Kedah, Kulim | 1.6 | 2000 | 200 | 250, 200, 180–90 | 46,000 | CMOS, HV, MEMS, RF, Logic, Analog, Mix Signal | |
Pyongyang Semiconductor Factory | 111 Factory | North Korea, Pyongyang | 1980s | 3000 [357] | |||||
DB HiTek | Fab 1 | South Korea, Bucheon [1] | 1997 [1] | Foundry | |||||
DB HiTek | Fab 2 | South Korea, Eumsung-Kun [1] | 2001 [1] | Foundry | |||||
DB HiTek | Fab 2 Module 2 | South Korea, Eumsung-Kun [1] | Foundry | ||||||
Kodenshi AUK Group [358] | Silicon FAB Line | ||||||||
Kodenshi AUK Group [358] | Compound FAB Line | ||||||||
Kyocera | SAW devices [150] | ||||||||
Seiko Instruments [359] | China, Shanghai | ||||||||
Seiko Instruments [359] | Japan, Akita | ||||||||
Seiko Instruments [359] | Japan, Takatsuka | ||||||||
NIPPON PRECISION CIRCUITS [204] | Digital | ||||||||
Epson [360] | T wing | Japan, Sakata | 1997 | 200 | 350-150 | 25,000 | |||
Epson [360] | S wing | Japan, Sakata | 1991 | 150 | 1200-350 | 20,000 | |||
Olympus Corporation [361] | Nagano | Japan, Nagano Prefecture | MEMS [362] | ||||||
Olympus | Japan | MEMS [363] | |||||||
Shindengen Electric Manufacturing [364] | Philippines, Laguna, Calamba | ||||||||
Shindengen Electric Manufacturing [364] | Thailand, Lamphun | ||||||||
NKK JFE Holdings [204] | 200 | 6000 | , | ||||||
New Japan Radio | Kawagoe Works | Japan, Saitama Prefecture, Fujimino City [365] [366] | 1959 [204] | 100, 150 | 4000, 400, 350 | Bipolar, Mixed Signal, Analog, Hi Speed BiCMOS, BCD, 40V Hi Speed Complementary Bipolar, Analog CMOS+HV, SAW Filters [367] | |||
New Japan Radio | Saga Electronics Archived 2017-09-19 at the Wayback Machine [368] | Japan, Saga Prefecture | 100, 150 | 4000, 400, 350 [369] | Foundry, Bipolar, Mixed Signal, Analog, Hi Speed BiCMOS, BCD, 40V Hi Speed Complementary Bipolar, Analog CMOS+HV, SAW Filters [367] | ||||
New Japan Radio | NJR FUKUOKA Archived 2017-09-18 at the Wayback Machine | Japan, Fukuoka Prefecture, Fukuoka City [368] | 2003 [370] | 100, 150 | Bipolar, Analog ICs, MOSFETs LSI, BiCMOS ICs | ||||
New Japan Radio | Japan, Nagano, Nagano City [371] | ||||||||
New Japan Radio | Japan, Nagano, Ueda City [371] | ||||||||
Nichia | YOKOHAMA TECHNOLOGY CENTER [372] | Japan, Kanagawa | LEDs | ||||||
Nichia | SUWA TECHNOLOGY CENTER [372] | Japan, Nagano | LEDs | ||||||
Taiyo Yuden | Japan, Nagano | SAW devices [150] | |||||||
Taiyo Yuden | Japan, Ome | SAW devices [150] | |||||||
NMB SEMICONDUCTOR [204] | DRAM | ||||||||
Silex Microsystems | Sweden, Stockholm County, Järfälla [1] | 0.009, 0.032 | 2003, 2009 [1] | ||||||
Elmos Semiconductor | Germany, North Rhine-Westphalia, Dortmund [373] | 1984 | 200 | 800, 350 | 9000 | HV-CMOS | |||
United Monolithic Semiconductors [374] | Germany, Baden-Württemberg, Ulm | 100 | 700, 250, 150, 100 | Foundry, FEOL, MMIC, GaAs pHEMT, InGaP, GaN HEMT, MESFET, Schottky diode | |||||
United Monolithic Semiconductors [374] | France, Île-de-France, Villebon-sur-Yvette | 100 | Foundry, BEOL | ||||||
Innovative Ion Implant | France, Provence-Alpes-Côte d'Azur, Peynier | 51–300 [375] | |||||||
Innovative Ion Implant | UK, Scotland, Bathgate | 51–300 [375] | |||||||
nanoPHAB | Netherlands, North Brabant, Eindhoven | 50–100 | 50-10 | 2–10 | MEMS | ||||
Micron Semiconductor Ltd. [376] | Lancing | UK, England, West Sussex, Lancing | Detectors | ||||||
Pragmatic Semiconductor | FlexLogic 001 | UK, England, Durham | 0.020 | 2018 | 200 | 600 | 4,000 | Flexible Semiconductor / Foundry and IDM | |
Pragmatic Semiconductor | FlexLogic 002 | UK, England, Durham | 0.050 | 2023 | 300 | 600 | 15,000 | Flexible Semiconductor / Foundry and IDM | |
Pragmatic Semiconductor | FlexLogic 003 | UK, England, Durham | 0.050 | Planned 2025 on line | 300 | 600 | 15,000 | Flexible Semiconductor / Foundry and IDM | |
INEX Microtechnology | UK, England, Northumberland, Newcastle upon Tyne | 2014 | 150 | Foundry | |||||
CSTG | UK, Scotland, Glasgow [1] [377] | 2003 [1] | 76, 100 | InP, GaAs, AlAs, AlAsSb, GaSb, GaN, InGaN, AlN, diodes, LEDs, lasers, PICs, Optical amplifiers, Foundry | |||||
Photonix | UK, Scotland, Glasgow [1] | 0.011 | 2000 [1] | ||||||
Integral | Belarus, Minsk | 1963 | 100, 150, 200 | 2000, 1500, 350 | |||||
VSP Mikron | WaferFab [378] | Russia, Voronezh Oblast, Voronezh | 1959 | 100, 150 | 900+ | 6,000 | Bipolar, Power Semiconductors | ||
Semikron | Nbg Fab | Germany, Nuremberg | 1984 | 150 | 3500 | 70,000 | Bipolar, Power Semiconductors | ||
NM-Tech | Russia, Moscow, Zelenograd | 2016 | 200 | 250-110 | 20,000 | ||||
Angstrem | Liniya 100 | Russia, Moscow, Zelenograd | 1963 | 100 | 1200 | 500 (6,000 per year) [379] | |||
Angstrem | Liniya 150 | Russia, Moscow, Zelenograd | 1963 | 150 | 600 | 6,000 (72,000 per year) [379] | |||
Mikron Group | Mikron | Russia, Moscow, Zelenograd | 0.4 [380] | 2012 | 200 150 100 | 250-65 2000-1600 | 3,000 8,000 5,000 | ||
Crocus Nano Electronics | Russia, Moscow | 0.2 | 2016 | 300 | 90-55 | 4,000 [381] | BEOL | ||
NIIIS | Russia, Nizhny Novgorod Oblast, Nizhny Novgorod | 2010 | 100–150 | 350-150 | MEMS | ||||
NPP Istok | Russia, Moscow Oblast, Fryazino | 150 | |||||||
Micran | Russia, Tomsk Oblast, Tomsk | 2015 | 100 | ||||||
Kremny El | Russia, Bryansk Oblast, Bryansk | 2019 | 500 | ||||||
Syntez Microelectronics | Russia, Voronezh Oblast, Voronezh | 1992 | 200 | 350-65 | SiC, GaN, TSV | ||||
NZPP Vostok | Russia, Novosibirsk Oblast, Novosibirsk | 1956 | 100 | 250-180 | |||||
Russian Space Systems | Russia, Moscow | 76, 100, 150 | 1000 | ||||||
Ruselectronics | Svetlana-Rost | Russia, Saint Petersburg | 50, 76, 100 | 1000, 800, 500, 200 | |||||
OKB-Planeta | Svetlana-Rost | Russia, Novgorod Oblast, Veliky Novgorod | 100 | 150 | |||||
FBK – Fondazione Bruno Kessler | MNF | Italy, Trento | 1990 | 500 | 150 | Research Institute; prototype productions of silicon MEMS, silicon radiation sensors | |||
CEITEC – Centro Nacional de Tecnologia Electrônica Avançada S.A | Brazil, Porto Alegre | 2008 | 600 | Research Institute; prototype production | |||||
Honeywell Aerospace Technologies | USA, Redmond, Washington | MEMS |
Number of open fabs currently listed here: 488
(NOTE: Some fabs located in Asia don't use the number 4, or any 2 digit number that adds up to 4, because it is considered bad luck; see tetraphobia.)
Company | Plant Name | Plant Location | Plant Cost (in US$ Billions) | Started Production | Wafer Size (mm) | Process Technology Node (nm) | Production Capacity (Wafers/Month) | Technology / Products | Ended Production |
---|---|---|---|---|---|---|---|---|---|
VEF | Soviet Union, Latvia, Riga | 1960 | Semi-secret government semiconductor fab and a major research center separated from the Russian military manufacturing complex by the collapse of the USSR. | 1999 | |||||
Tower Semiconductor (formerly Micron) | Fab 4 [382] | Japan, Hyōgo, Nishiwaki | 0.450 [1] | 1992 [1] | 200 | 95 | 60,000 [1] | DRAM, foundry | 2014 |
Tower Semiconductor – Tacoma | China, Jiangsu, Nanjing [383] [384] | halted, bankruptcy in June 2020 [385] | 200, 300 (planned) | Foundry | 2020 | ||||
Fujian Jinhua (JHICC) [18] [386] [387] [388] | F2 | China, Fujian, Jinjiang | 5.65 [389] | 2018 (planned) | 300 | 22 | 60,000 | DRAM [17] | 2018 |
Decoma [18] | F2 | China, Jiangsu, Huai'an | Under construction | 300 | 20,000 | 2020 | |||
Wuhan Hongxin Semiconductor Manufacturing (HSMC) [390] | China, Hubei, Wuhan | 2019 (halted) | 300 | 14, 7 | 30,000 [391] | Foundry | 2020 | ||
Tsinghua Unigroup – Unigroup Guoxin (Unigroup, Xi'an UniIC Semiconductors Co., Ltd.) [18] | SZ | China, Guangdong, Shenzhen | 12.5 | Planned | 300 | 50,000 | DRAM | 2019 (just plan) | |
TSMC | Fab 1 [230] [139] | Taiwan Hsinchu, Baoshan | 1987 | 150 | 2000-800 | 20,000 | Foundry, CMOS, BiCMOS | 2001, March 9 | |
UMC | Fab 1 | Japan, Chiba, Tateyama | 0.543 [1] | 1997 [1] | 200 | 40,000 | Foundry | 2012 | |
SK Hynix | E-4 | United States, Oregon, Eugene | 1.3 | 2007 | 200 | 30,000 | DRAM | 2008 [392] | |
Symetrix – Panasonic [393] | Brazil | 0.9 (planned) | planned | FeRAM | (just plan) | ||||
Rohm (formerly Data General) | United States, California, Sunnyvale [394] | ||||||||
Kioxia | Fab 1 (at Yokkaichi Operations) [395] | Japan, Mie, Yokkaichi | 1992 | 200 | 400 | 35,000 | SRAM, DRAM | 2001, September | |
NEC | Livingston [396] [87] | United Kingdom, Scotland, West Lothian, Livingston | 4.5 (total) | 1981 | 150, 200 | 800–350, 250, 180 | 30,000 | CMOS, DRAM, SRAM, MCUs, ASICs, DSPs | 2001, April |
LFoundry (formerly Renesas Electronics) [397] | Germany, Bavaria, Landshut | 1992 | 200 | 2011 | |||||
LFoundry (formerly Atmel) [398] | France, Bouches-du-Rhône, Rousset | ? | 200 | 25.000 [399] | |||||
Atmel (formerly Siemens) | Fab 9 [400] | United Kingdom, Tyne and Wear, North Tyneside | 1.53 [401] | 1998 [402] | DRAM [402] | 2007 [403] | |||
Microchip (formerly Atmel) [398] | United States, Colorado, Colorado Springs | 150 | |||||||
EI Niš | Ei Poluprovodnici | Serbia, Nišava, Niš | 1962 | 100 | 2000 | ||||
Plessey Semiconductors (formerly Plus Semi) (formerly MHS Electronics) (formerly Zarlink)(formerly Mitel) (formerly Plessey Semiconductors) | [189] | UK, Wiltshire, Swindon [1] | 100, 150 | 800, 500 | 8,000 | Bipolar, ASICs, linear ICs | |||
Telefunken Semiconductors | Heilbronn, HNO-Line [189] | Germany, Baden-Württemberg, Heilbronn | 0.125 [1] | 1993 [1] | 100, 150 | 800 | 10,000 | Bipolar, CMOS, BiCMOS, GaAs, SiGe, ASICs, ASSPs, MCUs, discrete, optoelectronics | 2015 |
Qimonda | Richmond [404] | United States, Virginia, Richmond | 3 | 2005 | 300 | 65 | 38,000 | DRAM | 2009, January |
STMicroelectronics (formerly Nortel [204] ) | [189] | United States, California, San Diego, Rancho Bernardo | 100, 150 | 800, 500 | NMOS, CMOS, BiCMOS | 2002 [405] | |||
Freescale Semiconductor (formerly Motorola) | Toulouse Fab [406] | France, Haute-Garonne, Toulouse | 1969 | 150 | 650 | Automotive | 2012 [407] | ||
Freescale Semiconductor (formerly Motorola) (formerly Tohoku Semiconductor) | Sendai Fab [408] | Japan, Miyagi, Sendai | 1987 | 150, 200 | 500 | DRAM, microcontrollers, analog, sensors | 2009? | ||
Agere Systems (formerly Lucent)(formerly AT&T) [409] | Spain, Madrid, Tres Cantos | 0.67 [410] | 1987 [411] | 500, 350, 300 | CMOS | 2001 | |||
GMT Microelectronics (formerly Commodore Semiconductor) (formerly MOS Technology) | United States, Pennsylvania, Audubon | 1969 1976 1995 | 1000 | 1976 1992 [412] 2001 | |||||
Integrated Device Technology | United States, California, Salinas | 1985 | 150 | 800-350 [413] | 2002 | ||||
ON Semiconductor (formerly Cherry Semiconductor) | [414] | United States, Rhode Island, East Greenwich | 100, 150 | 1400 | 10,000 | Bipolar, BiCMOS, Linear ICs and ASICs | 2004 | ||
ON Semiconductor (formerly Motorola) | [414] | United States, Arizona, Phoenix | 150 | 5000-500 | 12,000 | MOS, power discrete | 2011 | ||
ON Semiconductor (formerly Motorola) | Aizu Plant [414] | Japan, Aizu | 100, 150 | 1200, 1000 | 40,000 | CMOS, MCUs, logic and smart power ICs | 2012 | ||
ON Semiconductor (formerly Truesense Imaging, Kodak) | Rochester | United States, New York, Rochester [415] | 150 | CCDs and Image Sensors | 2020 | ||||
Intel | Fab 8 [59] | Israel, Jerusalem District, Jerusalem | 1985 | 150 | Microprocessors, Chipsets, Microcontrollers [60] | 2007 | |||
Intel | Fab D2 | United States, California, Santa Clara | 1989 | 200 | 130 | 8,000 | Microprocessors, Chipsets, Flash memory | 2009 | |
Intel | Fab 17 [50] [49] | United States, Massachusetts, Hudson | 1998 | 200 | 130 | Chipsets and other [49] | 2014 | ||
Fairchild Semiconductor (formerly National Semiconductor) | West Jordan | United States, Utah, West Jordan | 1977 | 150 | 2015 [416] | ||||
Texas Instruments | HFAB | United States, Texas, Houston | 1967 | 150 | 2013 [417] | ||||
Texas Instruments (formerly Silicon Systems) | Santa Cruz | United States, California, Santa Cruz | 0.250 | 1980 | 150 | 800 | 80,000 | HDD | 2001 |
Texas Instruments (formerly National Semiconductor) | Arlington | United States, Texas, Arlington | 1985 | 150 | 80000, 35000 | 2010 | |||
Unknown (fortune 500 company) | United States, East Coast [418] | 150 | 1,600 | MEMS | 2016 | ||||
Diodes Incorporated (formerly Lite-On Power Semiconductor) (formerly AT&T) | KFAB | United States, Missouri, Lee's Summit | 1994 [419] | 130 | 2017 [420] | ||||
Qorvo (formerly TriQuint Semiconductor) (formerly Sawtek) | United States, Florida, Apopka [74] [421] | SAW filters | 2019 | ||||||
GlobalFoundries | Abu Dhabi [1] | UAE, Emirate of Abu Dhabi, Abu Dhabi [1] | 6.8 [1] (planned) | 2016 [1] (planned) | 300 | 180-110 | 45,000 | Foundry | 2011 (plan stopped) |
GlobalFoundries – Chengdu | China, Sichuan, Chengdu [422] | 10 (planned) | 2018 (planned), 2019 (second phase) | 300 | 180/130 (cancelled), 22 (second phase) | 20,000 (85,000 planned) | Foundry, FDSOI (second phase) | 2020 (was idle) | |
Tondi Elektroonika [423] | A-1381 | Soviet Union, Estonia, Harju, Tallinn | 1958 | Radio equipment, Transisors, Photodiode | 1978 | ||||
Intersil (formerly Harris Semiconductor, formerly GE, formerly RCA) | [414] | United States, Ohio, Findlay | 1954 | 100, 125 | 2000, 1500, 1200 | 60,000 | CMOS, bipolar, BiCMOS, Semiconductors, Optoelectronics, Integrated Circuits, Research [424] | 2003 [425] |
Number of closed fabs currently listed here: 46
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as microprocessors, microcontrollers, and memories. It is a multiple-step photolithographic and physico-chemical process during which electronic circuits are gradually created on a wafer, typically made of pure single-crystal semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications.
In electronics, a wafer is a thin slice of semiconductor, such as a crystalline silicon, used for the fabrication of integrated circuits and, in photovoltaics, to manufacture solar cells.
STMicroelectronics NV is a European multinational semiconductor contract manufacturing and design company. It is the largest of such companies in Europe. It was founded in 1987 from the merger of two state-owned semiconductor corporations: Thomson Semiconducteurs of France and SGS Microelettronica of Italy. The company is incorporated in the Netherlands and headquartered in Plan-les-Ouates, Switzerland. Its shares are traded on Euronext Paris, the Borsa Italiana and the New York Stock Exchange.
Taiwan Semiconductor Manufacturing Company Limited is a Taiwanese multinational semiconductor contract manufacturing and design company. It is the world's most valuable semiconductor company, the world's largest dedicated independent ("pure-play") semiconductor foundry, and Taiwan's largest company, with headquarters and main operations located in the Hsinchu Science Park in Hsinchu, Taiwan. Although the central government of Taiwan is the largest individual shareholder, the majority of TSMC is owned by foreign investors. In 2023, the company was ranked 44th in the Forbes Global 2000. Taiwan's exports of integrated circuits amounted to $184 billion in 2022, accounted for nearly 25 percent of Taiwan's GDP. TSMC constitutes about 30 percent of the Taiwan Stock Exchange's main index.
The semiconductor industry is the aggregate of companies engaged in the design and fabrication of semiconductors and semiconductor devices, such as transistors and integrated circuits. It's roots can be traced to the invention of the transistor by Shockley, Brattain, and Bardeen at Bell Labs in 1948. Bell Labs licensed the technology for $25,000, and soon many companies, including Motorola (1952), Schockley Semiconductor (1955), Sylvania, Centralab, Fairchild Semiconductor and Texas Instruments were making transistors. In 1958 Jack Kilby of Texas Instruments and Robert Noyce of Fairchild independently invented the Integrated Circuit, a method of producing multiple transistors on a single "chip" of Semiconductor material. This kicked off a number of rapid advances in fabrication technology leading to the exponential growth in semiconductor device production, known as Moore's law that has persisted over the past six or so decades. The industry's annual semiconductor sales revenue has since grown to over $481 billion, as of 2018.
The foundry model is a microelectronics engineering and manufacturing business model consisting of a semiconductor fabrication plant, or foundry, and an integrated circuit design operation, each belonging to separate companies or subsidiaries. It was first conceived by Morris Chang, the founder of the Taiwan Semiconductor Manufacturing Company Limited (TSMC).
Fabless manufacturing is the design and sale of hardware devices and semiconductor chips while outsourcing their fabrication to a specialized manufacturer called a semiconductor foundry. These foundries are typically, but not exclusively, located in the United States, mainland China, and Taiwan. Fabless companies can benefit from lower capital costs while concentrating their research and development resources on the end market. Some fabless companies and pure play foundries may offer integrated-circuit design services to third parties.
The 90 nm process refers to the technology used in semiconductor manufacturing to create integrated circuits with a minimum feature size of 90 nanometers. It was an advancement over the previous 130 nm process. Eventually, it was succeeded by smaller process nodes, such as the 65 nm, 45 nm, and 32 nm processes.
Chartered Semiconductor Manufacturing, Inc. (CSM), was a Singaporean semiconductor company.
An integrated device manufacturer (IDM) is a semiconductor company which designs, manufactures, and sells integrated circuit (IC) products.
United Microelectronics Corporation is a Taiwanese company based in Hsinchu, Taiwan. It was founded as Taiwan's first semiconductor company in 1980 as a spin-off of the government-sponsored Industrial Technology Research Institute (ITRI).
In the microelectronics industry, a semiconductor fabrication plant, also called a fab or a foundry, is a factory where integrated circuits (ICs) are manufactured.
The transistor count is the number of transistors in an electronic device. It is the most common measure of integrated circuit complexity. The rate at which MOS transistor counts have increased generally follows Moore's law, which observes that transistor count doubles approximately every two years. However, being directly proportional to the area of a die, transistor count does not represent how advanced the corresponding manufacturing technology is. A better indication of this is transistor density which is the ratio of a semiconductor's transistor count to its die area.
The "14 nanometer process" refers to a marketing term for the MOSFET technology node that is the successor to the "22 nm" node. The "14 nm" was so named by the International Technology Roadmap for Semiconductors (ITRS). Until about 2011, the node following "22 nm" was expected to be "16 nm". All "14 nm" nodes use FinFET technology, a type of multi-gate MOSFET technology that is a non-planar evolution of planar silicon CMOS technology.
A multigate device, multi-gate MOSFET or multi-gate field-effect transistor (MuGFET) refers to a metal–oxide–semiconductor field-effect transistor (MOSFET) that has more than one gate on a single transistor. The multiple gates may be controlled by a single gate electrode, wherein the multiple gate surfaces act electrically as a single gate, or by independent gate electrodes. A multigate device employing independent gate electrodes is sometimes called a multiple-independent-gate field-effect transistor (MIGFET). The most widely used multi-gate devices are the FinFET and the GAAFET, which are non-planar transistors, or 3D transistors.
A three-dimensional integrated circuit is a MOS integrated circuit (IC) manufactured by stacking as many as 16 or more ICs and interconnecting them vertically using, for instance, through-silicon vias (TSVs) or Cu-Cu connections, so that they behave as a single device to achieve performance improvements at reduced power and smaller footprint than conventional two dimensional processes. The 3D IC is one of several 3D integration schemes that exploit the z-direction to achieve electrical performance benefits in microelectronics and nanoelectronics.
GlobalFoundries Inc. is a multinational semiconductor contract manufacturing and design company incorporated in the Cayman Islands and headquartered in Malta, New York. Created by the divestiture of the manufacturing arm of AMD, the company was privately owned by Mubadala Investment Company, a sovereign wealth fund of the United Arab Emirates, until an initial public offering (IPO) in October 2021.
In semiconductor manufacturing, the 3nm process is the next die shrink after the 5 nm MOSFET technology node. South Korean chipmaker Samsung started shipping its 3 nm gate all around (GAA) process, named 3GAA, in mid-2022. On 29 December 2022, Taiwanese chip manufacturer TSMC announced that volume production using its 3 nm semiconductor node (N3) was underway with good yields. An enhanced 3 nm chip process called "N3E" may have started production in 2023. American manufacturer Intel planned to start 3 nm production in 2023.
The semiconductor industry, including Integrated Circuit (IC) manufacturing, design, and packaging, forms a major part of Taiwan's IT industry. Due to its strong capabilities in OEM wafer manufacturing and a complete industry supply chain, Taiwan has been able to distinguish itself as a leading microchip manufacturer and dominate the global marketplace. Taiwan’s semiconductor sector accounted for US$115 billion, around 20 percent of the global semiconductor industry. In sectors such as foundry operations, Taiwanese companies account for 50 percent of the world market, with Taiwan Semiconductor Manufacturing Company (TSMC) the biggest player in the foundry market.